Two-dimensional negative capacitance transistor with polyvinylidene fluoride-based ferroelectric polymer gating
Two-dimensional negative capacitance transistor with polyvinylidene fluoride-based ferroelectric polymer gating
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具有聚偏二氟乙烯基铁电聚合物栅极的二维负电容晶体管
DOI:
10.1038/s41699-017-0040-4
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发表时间:
2017-11
影响因子:
9.7
通讯作者:
J. L. Wang
中科院分区:
文献类型:
--
作者:
X. D. Wang;Y. Chen;G. G. Wu;D. Li;L. Q. Tu;S. Sun;H. Shen;T. Lin;Y. G. Xiao;M. H. Tang;W. D. Hu;L. Liao;P. Zhou;J. L. Sun;X. J. Meng;J. H. Chu;J. L. Wang
Conventional field-effect transistors (FETs) are not expected to satisfy the requirements of future large integrated nanoelectronic.circuits because of these circuits’ ultra-high power dissipation and because the conventional FETs cannot overcome the.subthreshold swing (SS) limit of 60 mV/decade. In this work, the ordinary oxide of the FET is replaced only by a ferroelectric (Fe).polymer, poly(vinylidene difluoride-trifluoroethylene) (P(VDF-TrFE)). Additionally, we employ a two-dimensional (2D).semiconductor, such as MoS2 and MoSe2, as the channel. This 2D Fe-FET achieves an ultralow SS of 24.2 mV/dec over four orders of.magnitude in drain current at room temperature; this sub-60 mV/dec switching is derived from the Fe negative capacitance (NC).effect during the polarization of ferroelectric domain switching. Such 2D NC-FETs, realized by integrating of 2D semiconductors and.organic ferroelectrics, provide a new approach to satisfy the requirements of next-generation low-energy-consumption integrated.nanoelectronic circuits as well as the requirements of future flexible electronics.
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DOI:
10.1038/s43586-022-00151-5
发表时间:
2014-03
期刊:
Nature Reviews Methods Primers
影响因子:
--
作者:
R. Gorbachev
通讯作者:
R. Gorbachev
影响因子:
4.6
作者:
Park JH;Jang GS;Kim HY;Seok KH;Chae HJ;Lee SK;Joo SK
通讯作者:
Joo SK
DOI:
10.1109/tdei.2004.1285891
发表时间:
2004-06
影响因子:
3.1
作者:
Y. Takahashi;A. Kitahama;T. Furukawa
通讯作者:
Y. Takahashi;A. Kitahama;T. Furukawa
影响因子:
4.9
作者:
Jo, Jaesung;Shin, Changhwan
通讯作者:
Shin, Changhwan
DOI:
--
发表时间:
2017-04
期刊:
arXiv: Mesoscale and Nanoscale Physics
影响因子:
--
作者:
M. Si;C. Su;Chunsheng Jiang;N. Conrad;Hong Zhou;K. Maize;G. Qiu;C. Wu;A. Shakouri;M. Alam;P. Ye
通讯作者:
M. Si;C. Su;Chunsheng Jiang;N. Conrad;Hong Zhou;K. Maize;G. Qiu;C. Wu;A. Shakouri;M. Alam;P. Ye