Top surface modification of carbon film on its structure, morphology and electrical resistivity using electron-ion hybrid irradiation in ECR plasma
Top surface modification of carbon film on its structure, morphology and electrical resistivity using electron-ion hybrid irradiation in ECR plasma
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ECR等离子体中电子-离子混合辐照对碳膜的结构、形貌和电阻率进行顶面改性
DOI：
10.1016/j.surfcoat.2016.07.097
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发表时间：
2016-12
影响因子：
5.4
通讯作者：
Dongfeng Diao
中科院分区：
文献类型：
--
作者：
Chao Wang;Cheng Chen;Dongfeng Diao
提出了电子回旋共振（ECR）等离子体中的两步电子-离子混合辐照工艺作为获得低粗糙度和导电表面碳膜的灵活方法。通过在薄膜沉积过程中和沉积后结合电子辐照或离子辐照，实现了两种混合辐照模式：在i-e混合模式中，首先在离子辐照下沉积光滑的非晶碳薄膜，经过5分钟的电子辐照后，其电阻率从1.4降低到0.12Ω·cm−1。在e-i混合模式下，首先沉积导电石墨烯纳米晶薄膜，经过5分钟的离子辐照后，其表面Ra粗糙度从15.7纳米降低到0.063纳米。利用透射电子显微镜（TEM）、拉曼光谱、X射线光电子能谱（XPS）和原子力显微镜（AFM）展示了i-e模式下电子辐照下的顶面结构转变，并讨论了电子辐照在碳膜表面的有效深度。这项研究为大规模生产具有新颖纳米结构和出色物理性能的超光滑碳薄膜提供了一条实用途径，在纳米机械和纳米器件中具有潜在的应用前景。混合辐照方法还扩展了等离子体在薄膜沉积和表面改性领域的利用方式，并将激发各种具有改进顶表面的新型薄膜和涂层。
A two-step electron-ion hybrid irradiation process in electron cyclotron resonance (ECR) plasma was proposed as a flexible method to obtain carbon film with low roughness and electrical conductive surface. By the combination of either electron irradiation or ion irradiation during and after film deposition, two modes of hybrid irradiation were realized: In i-e hybrid mode, smooth amorphous carbon film was firstly deposited under ion irradiation, and its electrical resistivity was reduced from 1.4 to 0.12 Ω·cm− 1after 5-min electron irradiation. In e-i hybrid mode, conductive graphene nanocrystallited film was firstly deposited, and its surface Ra roughness was decreased from 15.7 to 0.063 nm after 5-min ion irradiation. The top surface structural transition under electron irradiation in the i-e mode were demonstrated by transmission electron microscopy (TEM), Raman spectra, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM), and the effective depth of electron irradiation on carbon film surface were discussed. This study provided a practical route to the massive production of ultra-smooth carbon films with novel nanostructure and outstanding physical properties for potential applications in nano-machinery and nano-devices. The hybrid irradiation method also expanded the way of plasma utilization in the fields of film deposition and surface modification, and will inspire various new films and coatings with improved top surfaces.
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影响因子：
4
作者：
Zhiwei Xu;Lei Chen;Jialu Li;Rui Wang;X. Qian;Xiao Song;Liangsen Liu;Guangwei Chen
通讯作者：
Zhiwei Xu;Lei Chen;Jialu Li;Rui Wang;X. Qian;Xiao Song;Liangsen Liu;Guangwei Chen
影响因子：
64.8
作者：
Kim, Keun Soo;Zhao, Yue;Hong, Byung Hee
通讯作者：
Hong, Byung Hee
电子回旋共振等离子体中电子辐照制备石墨烯片嵌入碳膜
影响因子：
4
作者：
Wang, Chao;Diao, Dongfeng;Fan, Xue;Chen, Cheng
通讯作者：
Chen, Cheng
影响因子：
5.4
作者：
Xue Fan;Dong-feng Diao;Kai Wang;Chao Wang
通讯作者：
Xue Fan;Dong-feng Diao;Kai Wang;Chao Wang
影响因子：
6.7
作者：
Wang, Chao;Zhang, Xi;Diao, Dongfeng
通讯作者：
Diao, Dongfeng