Electron-beam induced deposition and autocatalytic decomposition of Co(CO)3NO.
Electron-beam induced deposition and autocatalytic decomposition of Co(CO)3NO.
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DOI：
10.3762/bjnano.5.129
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发表时间：
2014
影响因子：
3.1
通讯作者：
Marbach H
中科院分区：
文献类型：
--
作者：
Vollnhals F;Drost M;Tu F;Carrasco E;Späth A;Fink RH;Steinrück HP;Marbach H
研究了五羰基铁Fe（CO）5和三羰基亚硝酰钴Co（CO）3NO两种前驱体对电子束诱导沉积（EBID）和电子束诱导表面活化（EBISA）制备的任意形状纳米结构的自催化生长。在微真空条件下在氮化硅膜和硅片上制备了不同的沉积物，并通过扫描电子显微镜（SEM）和扫描透射X射线显微镜（STXM），包括近边X射线吸收精细结构（NEXAFS）光谱进行了研究。先前已经表明，Fe（CO）5在Fe种子层（EBID）和某些电子束活化的表面上自催化分解，产生高纯度的多晶Fe纳米结构。在这方面的贡献，我们调查的增长从Co（CO）3NO的结构，并比较它从Fe（CO）5得到的结果。Co（CO）3NO表现出自催化生长的含钴种子层EBID使用相同的前体。生长产生颗粒状的含氧、碳和氮的沉积物。与Fe（CO）5相反，在电子束活化的表面上没有观察到分解。此外，我们表明，从Co（CO）3NO纳米结构的自催化生长也可以由Fe种子层，这提出了一种新的方法来制造层状纳米结构。
The autocatalytic growth of arbitrarily shaped nanostructures fabricated by electron beam-induced deposition (EBID) and electron beam-induced surface activation (EBISA) is studied for two precursors: iron pentacarbonyl, Fe(CO)5, and cobalt tricarbonyl nitrosyl, Co(CO)3NO. Different deposits are prepared on silicon nitride membranes and silicon wafers under ultrahigh vacuum conditions, and are studied by scanning electron microscopy (SEM) and scanning transmission X-ray microscopy (STXM), including near edge X-ray absorption fine structure (NEXAFS) spectroscopy. It has previously been shown that Fe(CO)5 decomposes autocatalytically on Fe seed layers (EBID) and on certain electron beam-activated surfaces, yielding high purity, polycrystalline Fe nanostructures. In this contribution, we investigate the growth of structures from Co(CO)3NO and compare it to results obtained from Fe(CO)5. Co(CO)3NO exhibits autocatalytic growth on Co-containing seed layers prepared by EBID using the same precursor. The growth yields granular, oxygen-, carbon- and nitrogen-containing deposits. In contrast to Fe(CO)5 no decomposition on electron beam-activated surfaces is observed. In addition, we show that the autocatalytic growth of nanostructures from Co(CO)3NO can also be initiated by an Fe seed layer, which presents a novel approach to the fabrication of layered nanostructures.
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影响因子：
3.1
作者：
Muthukumar K;Jeschke HO;Valentí R;Begun E;Schwenk J;Porrati F;Huth M
通讯作者：
Huth M
影响因子：
3.4
作者：
Fernandez-Pacheco, A.;De Teresa, J. M.;Ibarra, M. R.
通讯作者：
Ibarra, M. R.
影响因子：
17.1
作者：
Gavagnin, Marco;Wanzenboeck, Heinz D.;Bertagnolli, Emmerich
通讯作者：
Bertagnolli, Emmerich
影响因子：
3.4
作者：
Friedli, V.;Utke, I.
通讯作者：
Utke, I.
影响因子：
2.3
作者：
Gazzadi, G. C.;Mulders, J. J. L.;Frabboni, S.
通讯作者：
Frabboni, S.