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Geometric Structure and Vibrational Characteristics of Clean and Absorbate Covered Metal and Semiconductor Surfaces

Geometric Structure and Vibrational Characteristics of Clean and Absorbate Covered Metal and Semiconductor Surfaces
清洁和吸收覆盖的金属和半导体表面的几何结构和振动特性
批准号:
8702006
负责人:
William Graham
金额:
$0.0万
依托单位:
依托单位国家:
美国
项目类别:
Continuing grant
财政年份:
1988
资助国家:
美国
项目状态:
已结题
起止时间:
1988-02-15 至 1992-01-31

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中文摘要
翻译
本研究采用中能离子散射(MEIS)结合沟道和阻塞来描述金属和半导体表面的三维几何结构和振动特性。从被检查表面的散射的计算机模拟有助于结构分析。该计划最初的重点是铁、铝、铜、硅和锗。这项研究为表面结构理论的发展提供了必要的实验数据。
英文摘要
This research employs MEIS (medium energy ion scattering) combined with channeling and blocking to describe the three- dimensional geometric surface structure and vibrational characteristics of metal and semiconductor surfaces. Computer simulation of scattering from the examined surfaces assists in the structure analysis. Initial emphasis in the program is on iron, aluminum, copper, silicon and germanium. This research provides experimental data needed for development of theories of surface structure.
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