In Situ Direct Patterning of MBE Films Using Ion Assisted Etching

人们正在做出相当大的努力来生长可控的薄层， 各种半导体和其他类型的材料。 这些都 在电子制造中越来越重要， 器件和光电器件，并将看到越来越重要的 在未来 沿着制造这些层的能力， 有利的是能够原位写入图案，即， 层正在生长。 这项建议针对的是 这样的模式。

Considerable effort is being made to grow controlled thin layers of a variety of semiconductors and other type of materials. These have been of increasing importance in the fabrication of both electronic devices and optoelectronic devices and will see increasing importance in the future. Along with the ability to fabricate the layers it would be advantageous to be able to write patterns in situ, that is while the layers are being grown. This proposal addresses problems associated with such patterning.