MRI: Acquisition of a versatile direct write micro patterning system for research and education

1040344奥斯汀集成微细加工实验室(IML)是杨百翰大学(BYU)校园内一个2500平方英尺的10类洁净室。这是一个开放获取的设施，任何附属于该大学的人都可以免费使用。该设施支持外部和内部资助的研究项目，以及本科生和研究生实践教学实验室。它的工具包专注于用于光子学、MEMS微流体和传感器等领域的器件制造的微和纳米制造工艺。可用的工艺包括光刻、薄膜沉积、化学机械平坦化、反应离子刻蚀和各种类型的计量。然而，目前的许多研究项目需要在非平面基板上进行光刻，这是他们目前没有的能力。其他项目需要以三维方式编写，这也不能使用现有的工具来完成。这项提议的目标是获得一种无掩模、三维直写微光刻系统，以满足这些关键需求。直写光刻是一种革命性的新技术，其中衬底是使用光学成像而不是使用光掩模来形成图案的。增加这一提议中规定的这种仪器将为IML增加最先进的无掩模光刻能力，并补充现有的基础设施。

1040344AustinThe Integrated Microfabrication Laboratory (IML) is a 2,500 square foot Class 10 cleanroom on the Brigham Young University (BYU) campus. It is an open access facility that is freely available for use by anyone affiliated with the university. The facility supports externally- and internally-funded research projects, and both undergraduate and graduate hands-on instructional laboratories. Its toolset is focused on micro and nanofabrication processes for device fabrication in areas such as photonics, MEMS microfluidics, and sensors. The available processes include photolithography, thin film deposition, chemical-mechanical planarization, reactive ion etching, and various types of metrology. However, many current research projects require lithography on non-planar substrates, a capability they do not currently have. Other projects require writing in three dimensions, which also cannot be done using existing instrumentation. The goal of this proposal is the acquisition of a maskless, 3-dimensional direct-write microlithography system to address these critical needs. Direct-write lithography is a revolutionary new technique in which substrates are patterned using optical imaging rather than using photomasks. The addition of such an instrument as specified in this proposal would add state-of-the-art maskless lithography capability to the IML and complement existing infrastructure.