Theoretrical and Experimental Studies of Laser Chemical Vapor Deposition for Selected Area Deposition of Pure Titanium

激光化学气相沉积（LCVD）技术可用于 通过精确的空间控制生产薄层材料。 虽然这一点已得到明确证明，但几乎没有采取任何行动 了解LCVD工艺的基本原理。 实验 纯钛沉积机理的研究将是 利用光学、热学和化学性质进行。 的 结果将用于开发通用数学模型， 沉积过程。

Laser Chemical Vapor Deposition (LCVD) techniques can be used to produce thin layers of materials with precise spatial control. Although this has been clearly demonstrated, little has been done to understand the fundamentals of the LCVD process. Experimental studies of the deposition mechanism for pure titanium will be conducted using optical, thermal and chemical properties. The results will be used to develop generic mathematical models for the deposition process.