Interface Velocity and Pattern Formation in Electrochemical Deposition Far from Equilibrium

基于理论的工程相关性被开发用于 结构、标度性质和生长的预测 在电化学沉积中远离平衡的速度。 结构和结构转变与 控制参数，并以高分辨率记录 显微照相术 关于不稳定的原则 最初平稳的增长前沿及其动态 重新稳定为结构化聚集体的公式如下： 扩散和电场分析， 考虑浓度、动力学过电位和 双层充电 纹影摄影用于成像 扩散场周围的增长聚集体。 的作用 用交流阻抗法探测表面过电位 测量. 在这个项目中开发的理论和控制 由此衍生的战略将具有广泛的适用性 无论何时电诱导聚集是必要的 或有害的。 试验验证用试验金属 选择技术相关，以便 结果应立即适用于电池， 微电子电路生产。

Theoretically based engineering correlations are developed for prediction of structure, scaling properties, and growth velocities far from equilibrium in electrochemical deposition. Structures and structural transitions are correlated with control parameters and are recorded with high-resolution photomacroscopy. The principles governing destabilization of an initially smooth growth front and its dynamic restabilization into a structured aggregate are formulated by analysis of the diffusion and electric fields with consideration of concentration, kinetic overpotential, and double-layer charging. Schlieren photography is used to image the diffusion field around growing aggregates. The role of the surface overpotential is probed using AC impedance measurements. The theory developed in this project and the control strategies derivative from it will have broad applicability whenever electrically induced aggregation is either necessary or detrimental. Test metals for the experimental verification are selected to be technologically relevant, so that the results should be immediately applicable in battery and microelectronic circuit production.