Atomic Force Microscopic and Ring Disk Voltammetric Studies on the Role of Chloride and Oxygen in Copper Electroplating
Atomic Force Microscopic and Ring Disk Voltammetric Studies on the Role of Chloride and Oxygen in Copper Electroplating
批准号:
9622634
负责人:
Dale Barkey
金额:
$3.13万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-04-01 至 1997-03-31
中文摘要
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英文摘要
ABSTRACT CTS-9622634 A rotating ring/disk electrode (RDE) system and a control system for an atomic force microscope (AFM) are acquired. They are used to study the roles of chloride and dissolved oxygen in copper electroplating, including effects on the kinetics of deposition and on morphological development such as crystalline anisotropy, kinetic roughening, and facet formation. ***
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