Assesment of Plasma Processing of Materials

这一拟议项目将涉及评估 低温等离子体的基础科学 对工业的重要性，特别是在 材料加工和半导体制造。 最近成立的等离子体科学委员会 在NAS/NRC的主持下， 统一看待等离子体领域， 包括NSF（ENG， 土力工程处）成立了一个小组委员会， 低温等离子体科学领域， 技术. 小组委员会建议 举办了一个由大约10名专家参加的讲习班， 深入了解研究需求和机会 在这一领域内：（一）确定关键的研究问题 等离子体物理学和化学以及 （二）评估等离子体表面的潜力; 低温等离子体进展的影响 表面处理技术科学， 强调半导体应用;及（iii） 揭露科技教育 等离子体科学界的问题。

This proposed project would involve an assessment of the basic science underlying low-temperature plasma processes of importance to industry, particularly in materials processing and semiconductor fabrication. The Plasma Science Committee, recently constituted under the auspices of the NAS/NRC with a charge to take a unified look at the plasma field, and funded by several federal agencies including the NSF (ENG, PHY, GEO), has established a subcommittee to study the area of low-temperature plasma science and technology. The subcommittee has recommended holding a workshop of some 10 specialists to take an indepth view of the research needs and opportunities within this area: (i) to identify key research problems in plasma physics and chemistry and the interaction of plasmas with surfaces; (ii) to evaluate the potential impact of advances in low-temperature plasma science on surface processing technology, with an emphasis on semiconductor applications; and (iii) to expose the scientific, technological and educational issues to the plasma science community.