REG: A High Temperature X-Ray Diffraction Facility

这就要求有现代化的X射线衍射仪。新设备的功能将包括带有加热台的粉末衍射仪、用于薄膜和多层表征的掠角入射光学器件，以及用于应变层外延薄膜缺陷表征的专用双晶X射线衍射仪。在X射线衍射仪上对陶瓷和金属间化合物基复合材料的原位加热热氧化及其与力学行为的关系进行了研究。另一个将从新仪器中受益的研究项目是用新的化学气相渗透(CVI)技术合成的陶瓷复合材料的分析表征。类似地，X射线衍射工作将用于化学气相沉积陶瓷薄膜的保护涂层应用，以及研究现场环境反应和微结构随温度的变化。对于半导体薄膜和多层膜，利用高温X射线衍射仪确定相稳定性和合金形成对于优化不影响器件性能的顺序工艺步骤非常重要。

Modern X-ray diffraction (XRD) equipment is requested. The capabilities of the new equipment will include a powder diffractometer with a heating stage, glancing angle incidence optics for thin film and multilayer characterization, and a dedicated double-crystal X-ray diffractometer for defect characterization of strained-layer epitaxial thin films. A study on thermal oxidation of ceramic and intermetallic matrix composites by in situ heating in an X-ray diffractometer and correlation with mechanical behavior is anticipated. Another research program that will benefit strongly from the new instrument, is analytical characterization of ceramic composites synthesized by the novel Chemical Vapor Infiltration (CVI) technique. Similarly, XRD work will be applied to chemically vapor deposited ceramic thin films for protective coating applications, as well as investigating in situ environmental reactions and microstructural changes as a function of temperature. For semiconductor thin films and multilayers, determination of phase stability and alloy formation by high temperature X-ray diffractometer is important for optimization of sequential processing steps that won't compromise device performance.