A Pattern-Deviation Scanner for Precise Measurement of Internal Component Locations

该提案将研究测量到非常高分辨率（+200微米）的已知成分的多个组件的位置的可行性，这些组件的位置旨在符合结构内部定义良好的模式。所提出的技术依赖于扫描穿过结构表面的光子光束，在准直探测器中检测传输和散射辐射，并采用模板匹配等技术，该技术包含诸如组件的大小和组成及其预期模式等先验信息。结合实验和理论研究，研究了光源能量、光源和探测器准直、扫描模式、扫描步长和速度、以及实际仪器所需的探测器数量和位置等设计问题。

This proposal will investigate the feasibility of measuring to very high resolution (+200 microns) the locations of multiple components of known composition whose positions are intended to conform to a well-defined pattern inside a structure. The proposed technique relies on scanning photon beams across the structure surface, detecting transmitted and scattered radiation in collimated detectors, and employing techniques such as template-matching that incorporate a priori information such as size and composition of the components and their intended pattern. A combined experimental and theoretical investigation is undertaken to study design issues such as source energy, source and detector collimation, scan mode, scan step size and speed, and required number of detectors and their locations for a practical instrument.