Feedback Control In Semiconductor Manufacturing: Reactive Ion Etching

9312134 Khargonekar这项建议是系统/控制和固态电子专家推动控制和系统理论应用于半导体制造设备的实时反馈控制的主要努力的一部分。我们选择了反应离子刻蚀(RIE)作为我们的初步研究工具。该方案描述了将实时控制系统理论和技术应用于RIE所需的基础研究。我们的总体目标是重新设计RIE机器，以增强可控性和改进性能。我们相信，这项研究计划有可能极大地改善RIE的性能特征，从可达到的特征尺寸、晶片加工的一致性和成品率来衡量。***

9312134 Khargonekar This proposal is part of a major effort by systems/control and solid state electronics specialists to advance the application of control and systems theory to real time feedback control of semiconductor manufacturing equipment. We have chosen Reactive Ion Etching (RIE) as our initial research vehicle. This proposal describes fundamental research necessary for the application of real time control systems theory and technology to RIE. Our overall goal is to redesign the RIE machine for enhanced controllability and improved performance. We believe that this research program has the potential of offering dramatic improvement in the performance characteristics of RIE as measured by attainable feature size, uniformity of wafer processing, and yield. ***