NSF Young Investigator

9458081 Eom本项目旨在研究氧化物的基本材料科学现象，以获得对这些材料的原子水平的理解，并探索它们在先进集成微电子、光学和磁性器件中的应用。我们的方法利用了一种兼容特高压的通用薄膜沉积系统，该系统将用于生长外延异质结构。该系统将在一个腔室中结合90度离轴溅射、轴上溅射、激光烧蚀、蒸发和蚀刻，并且还将允许各种类型结构的原位沉积和图像化。氧化物材料具有广泛的特性，可用于超导体、介电材料、铁电材料、铁磁性材料和非线性光学元件等各种应用。许多先进器件对具有这种混合性能的外延多层膜的要求可以用氧化薄膜异质结构来实现。该研究将为氧化物多层器件结构的设计提供指导，并将刺激对新型氧化物材料的研究。该研究项目的一个重要特点是培养研究生和本科生在材料和加工研究的基础和技术上具有重要意义的领域。* * *

9458081 Eom This project is directed both at studying fundamental materials science phenomena of oxides to gain atomic-level understanding of these materials, and at exploring their utilization in advanced integrated microelectronic, optical and magnetic devices. Our approach utilizes a UHV-compatible versatile thin film deposition system which will be used to grow epitaxial heterostructures. This system will combine 90o off-axis sputtering, on-axis sputtering, laser ablation, evaporation, and etching in one chamber, and will also allow in situ deposition and patterning of various types of structures. %%% Oxide materials possess an enormous range of properties and can be utilized for a wide variety of applications involving superconductors, dielectrics, ferroelectrics, ferromagnetics, and nonlinear optics components. The requirement by many advanced devices for epitaxial multilayers with such mixed properties can potentially be achieved with oxide thin film heterostructures. This study will provide a guideline for the design of oxide multilayer device structures and will also stimulate research into new oxide materials. An important feature of this research project is the training of graduate and undergraduate students in a fundamentally and technologically significant area of materials and processing research. ***