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Ninth International Conference on Molecular Beam Epitaxy; Pepperdine University, Malibu, California; August 5-9, 1996

Ninth International Conference on Molecular Beam Epitaxy; Pepperdine University, Malibu, California; August 5-9, 1996
第九届国际分子束外延会议;
批准号:
9628762
负责人:
Kang Wang
金额:
$0.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-06-01 至 1997-05-31

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中文摘要
翻译
9628762王安分子束外延国际会议正在举行,以探讨分子束外延现象的新的、更微观的方面。新一代青年科学家正在通过先进的加工和表征技术来研究化合物和元素半导体在外延早期阶段界面、薄膜表面演化和连续薄膜发展等关键方面的化学动力学反应和机理。目前半导体材料在晶格失配条件下生长的主题,以及相关的原位先进材料表征是会议不可分割的一部分。将有机会进入该领域,并在大学、研究机构和行业之间建立联系。预计该领域的顶尖科学家将出席,会议将提供一个有效的论坛,讨论和描述这一重要研究领域的关键科学问题,并审议和确定解决这些问题所需的方法和技术。评估分子束外延及相关材料加工和表征问题的进展和现状,特别是异质外延、加工、材料研究与器件和电路制造的关系等关键材料研究领域的进展和现状,以及对该领域最重要发展的最新评估,将对理解和提高电子和光子学领域先进材料的利用具有重要价值。*_
英文摘要
9628762 Wang An International Conference on Molecular Beam Epitaxy(MBE) is being held to address new, more microscopic aspects of MBE phenomena. Chemical kinetic reactions and mechanisms in critical aspects of interfaces, thin film surface evolution and continuous film development during early stages of epitaxy of both compound and elemental semiconductors ar e being addressed through advanced processing and characterization techniques being studied by a new generation of young scientists. Current topics in semiconductor materials growth under lattice mismatch conditions, and related in situ advanced materials characterization are an integral part of the conference. There will be an opportunity to a ssess the field, and to establish ties between universities, research institutions, and industry. It is expected that top scientists in the field will attend, and that the Conference will provide an effective forum to discuss and delineate critical scientific issues in this important research area, and to consider and define the approaches and te chniques needed to address them. %%% An evaluation of the progress and status of Molecular Beam Epitaxy and related materials processing and characterization issues, especially critical materials research areas of hetero-epitaxy, processing, and the relationship of materials research to device and circuit fabrication along with current assessments of the most important developments in this field will be of great value to the understanding and enhanced utilization of advanced materials in the field of electronics and photonics. *** _
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