Molecular Beam Mass Spectrometry Studies of the Kinetics and Mechanism of the Thermal and Plasma-Enhanced Chemical Vapor Deposition of Transition and Main Group Nitrides

9631794阿马托-韦尔达这项研究计划补助金涉及几种金属氮化物的热和等离子体增强化学气相沉积(CVD)的气相化学。分子束质谱(MBMS)正被耦合到一个快速流动反应器，以便原位和实时地监测CVD反应的气相物种和动力学。各种前驱体体系将被研究，包括过渡金属和主族金属M(NR2)n和氨的均相二烷基酰胺络合物，以及更传统的体系，如金属卤化物(MX4)和氨。热CVD研究还将考察无氨条件下的单源前驱体，包括Ti(NMe2)4和Ti(NMe2)3(t-Bu)，以及TiCl2(NHT-Bu)2(NHT-Bu)2n。气相物种及其形成动力学将取决于反应条件：温度、反应物的总压和分压以及停留时间。此外，薄膜将被同时沉积，并且气相物种与薄膜的性质相关，例如，生长速度、化学计量比和成分。在分子水平上对气相化学的了解对于未来化学气相沉积(CVD)材料合成的合理和显著的改进是至关重要的。更重要的是，对CVD气相化学和动力学的探索对于发展一般反应模型以及了解前驱体系统、反应性模式和最终薄膜性质之间的关系是必要的。虽然这个项目将主要集中于反应动力学和机理的研究，但它也将有助于更广泛地了解氮化物材料的合成和加工问题。规划补助金将帮助PI完成足够的前期工作，以显示想法的前景或根据获得的数据对其进行修改。因此，规划期内的支助将有助于私人投资编写一份更具竞争力的全面提案。***

9631794 Amato-Weirda This Research Planning Grant addresses gas-phase chemistry of thermal and plasma-enhanced chemical vapor deposition(CVD) of several metal nitrides. Molecular beam mass spectrometry (MBMS) is being coupled to a fast-flow reactor in order to monitor in situ and in real time gas-phase species and the kinetics of CVD reactions. Various precursor systems will be investigated including homoleptic dialkylamido complexes of transition and main group metals M(NR2)n and ammonia, and more traditional systems such as metal halides(MX4) and ammonia. Thermal CVD studies will also investigate single-source precursors including Ti(NMe2)4 and Ti(NMe2)3(t-Bu) in the absence of ammonia, and TiCl2(NHt-Bu)2(NHt-Bu)2 n. Gas-phase species and the kinetics of their formation will be determined as a function of reaction conditions: temperature, total and partial pressures of reactants, and residence time. Additionally, films will be deposited simultaneously and gas-phase species correlated to film properties such as, growth rate, stoichiometry, and composition. %%% The understanding of gas-phase chemistry at the molecular level is crucial for future rational and significant improvement in materials synthesis by chemical vapor deposition(CVD). More importantly the exploration of CVD gas-phase chemistry and kinetics is necessary for the development of general reaction modeling, as well as understanding the relationships among precursor systems, reactivity patterns, and final film properties. While this project will focus primarily on the study of kinetics and mechanisms of reactions, it will also contribute to a greater general understanding of nitrides materials synthesis and processing issues. The planning grant will aid the PI in accomplishing enough preliminary work to show the promise of ideas or to modify them based on the data acquired. Thus, support during the planning period will aid the PI in preparing a more competitive full proposal. ***