Investigation of the Chemical Physics of Light Enhanced Epitaxy on II-VI Semiconductor Surfaces

9632456奥斯古德本研究项目旨在更深入地了解半导体表面的非平衡化学，适用于先进的II-VI薄膜外延生长方法，包括新的表面清洁/制备技术，以及适用于原子层外延技术的顺序反应路线。总体目标是了解两类光助外延模型分子系统(MOCVD、MOMBE和ALE)的基本微观机制；金属烷基(二甲基锌和二乙基镉)和第六族卤化物(H_2S和H_2Se)将被研究。俄歇和光电子能谱以及热脱附和飞行时间质谱学将用于评估反应产物和结合位置、抛射碎片平动能和反应截面。该项目是一个多学科的项目，将基础材料化学和材料科学、合成和加工研究与先进的表征工具和分析方法相结合，以解决具有技术相关性和高潜在回报的热门领域的前沿问题。这项研究将在基础水平上为先进电子/光子器件和集成电路的几个方面贡献基本的材料科学知识。从这项研究项目中获得的知识和理解有望为改进材料和材料组合的设计和生产提供基本的理解和基础，从而在总体上为提高先进器件和电路的性能做出贡献。该计划的一个重要特点是通过在一个具有根本意义和技术意义的领域对学生进行培训，将研究和教育结合起来。***

9632456 Osgood This research project aims for greater fundamental understanding of non-equilibrium chemistries at semiconductor surfaces appropriate for advanced approaches to epitaxial growth of II-VI thin films, including new surface cleaning/preparation techniques, and routes to sequential reactions which are applicable to the technique of atomic layer epitaxy. The overall objective is to understand fundamental microscopic mechanisms in two classes of model molecular systems for light-assisted epitaxies(MOCVD, MOMBE, and ALE); metal alkyls(di-methyl zinc and di-ethyl cadmium) and Group VI halides(H2S and H2Se) on CdTe and ZnSe surfaces will be studied. Auger and photoelectron spectroscopies along with thermal desorption and time of flight mass spectroscopy will be used to assess reaction products and binding sites, ejected fragment translational energy, and reaction cross sections. %%% The project is multidisciplinary combining fundamental materials chemistry and materials science synthesis and processing studies with advanced characterization tools and analysis methods to address forefront issues in a topical area of technological relevance and high potential payoff. The research will contribute basic materials science knowledge at a fundamental level to several aspects of advanced electronic/photonic devices and integrated circuitry. The knowledge and understanding gained from this research project is expected to contribute in a general way to improving the performance of advanced devices and circuits by providing a fundamental understanding and a basis for designing and producing improved materials, and materials combinations. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area. ***