Dynamic Chemical Processes of Radicals and Carbenes at Carbonaceous Surfaces

9712263这个研究项目，由分析和表面化学计划和多学科活动办公室的支持，重点是改性和控制非晶和金刚石形式的碳的表面性质的化学研究。 西密歇根大学的米勒教授和他的学生将使用广泛的真空表面工具来表征这些表面。 这些表面的化学改性将涉及这些碳表面与各种自由基物质的光化学引发反应。 这种推力为开发化学改性碳的高度不反应表面的方法提供了希望，特别是以金刚石的形式。 除了这些基本的实验活动，分子动力学计算将被应用于更好地了解化学发生在这些表面涉及卡宾和自由基，并开发这些反应的模拟，可用于本科和研究生教学设置。 碳材料在半导体领域中的使用受到其表面的非反应性性质的限制。 在这项工作中，光化学引发的反应，已被证明是可行的无定形碳和金刚石表面将进一步研究，以优化这些化学反应的控制。 这些碳表面的成功化学改性提供了在许多实际应用中使用碳，特别是金刚石的潜力，这些实际应用需要特定的表面功能，包括微电子器件，需要强大的粘附力的材料，和半导体。

9712263This research project, supported by the Analytical and Surface Chemistry Program and the Office of Multidisciplinary Activities, focuses on the study of the chemistry of modifying and controlling the surface properties of amorphous and diamond forms of carbon. Professor Miller and his students at Western Michigan University will use a broad range of ultrahigh vacuum surface tools to characterize these surfaces. The chemical modification of these surfaces will involve photochemically initiating reactions of these carbon surfaces with a variety of radical species. This thrust offers promise in developing ways to chemically modify the highly unreactive surfaces of carbon, particularly in the form of diamond. In addition to these fundamental experimental activities molecular dynamics calculations will be applied to better understand the chemistry that occurs at these surfaces involving carbenes and radicals and to develop simulations of these reactions that can be used in undergraduate and graduate teaching settings. The use of carbon materials in the semiconductor field is limited by the unreactive nature of their surfaces. In this work photochemically initiated reactions that have been shown to be feasible on both amorphous carbon and diamond surfaces will be further studied to optimize the control of these chemical reactions. Successful chemical modification of these carbon surfaces offers the potential to use carbon, especially diamond, in a number of practical applications that require the availability of particular surface functionalities including microelectronic devices, materials requiring robust adhesion, and semiconductors.