Periodic Structures in the Study and Control of Surface Microtopography and Lattice Strain

小行星9725082 该项目利用周期性结构进行半导体表面动力学的基础研究，无台阶衬底的生产，以及高纵横比纳米结构的氧化。中尺度结构的演变将在一个上下文中进行研究，其中连接到底层的物理机制和适当的理论方法来描述宏观结构的演变。该项目的重点是对表面结构缺陷的基本理解和控制，表面形态变化的动力学，以及形态对近表面区域晶格应变的影响。最初，大部分实验将用硅进行，但将考虑扩展到其他材料，Ge，C，GaAs和SiGe合金。结构和动力学研究的主要实验方法将是扫描隧道和原子力显微镜，低能电子衍射和显微镜和表面X射线衍射。 传统的纳米纤维样品制备方法将由新技术来补充，以创建周期性图案化的表面非常小的周期。 该项目解决了具有高技术相关性的材料科学专题领域的基础研究问题。该研究将在基础层面上为电子/光子器件的重要方面提供基础材料科学知识。 现在已有实验工具，可以在原子水平上观察基本表面过程，如果能更好地了解这些过程，将有助于基础科学和技术的进步。 从研究中获得的基本知识和理解，预计将有助于提高先进器件和电路的性能和稳定性，为设计和生产改进的材料和材料组合提供基本的理解和基础。 该计划的一个重要特点是通过在一个基本和技术上重要的领域培养学生，将研究和教育相结合。 ***

9725082 Blakely This project utilizes periodic structures for fundamental studies of the dynamics of semiconductor surfaces, the production of stepfree substrates, and oxidation of high aspect-ratio nanostructures. The evolution of mesoscale structure will be studied in a context in which connection to the underlying physical mechanisms and appropriate theoretical approach to describing macroscopic structure evolution are addressed. Focus of the project is on fundamental understanding and control of surface structural defects, the kinetics of surface morphological changes, and the effect of morphology on lattice strain in the near-surface region. Initially most of the experiments will be done with silicon, but extension to other materials, Ge, C, GaAs and SiGe alloys will be considered. Major experimental methods for the structural and kinetic studies will be scanning tunneling and atomic force microscopy, low energy electron diffraction and microscopy and surface X-ray diffraction. Conventional nanofabrication methods of sample preparation will be complemented by novel techniques to create periodically patterned surfaces of very small periods. %%% The project addresses basic research issues in a topical area of materials science having high technological relevance. The research will contribute basic materials science knowledge at a fundamental level to important aspects of electronic/photonic devices. Experimental tools are now available to allow atomic level observation of elementary surface processes which when better understood will allow advances in both fundamental science and technology. The basic knowledge and understanding gained from the research is expected to contribute to improving the perform ance and stability of advanced devices and circuits by providing a fundamental understanding and a basis for designing and producing improved materials, and materials combinations. An important feature of the program is the integration of researc h and education through the training of students in a fundamentally and technologically significant area. ***