Step Edge Decoration and the Characterization of Substrate Misorientation Effects on Thin Film Nucleation

本研究项目是关于台阶缺陷和边缘缺陷对金属薄膜的化学和生长的影响。利用弹性和非弹性氦原子散射方法，结合光斑轮廓分析和低能电子衍射研究，罗格斯大学的芭芭拉·J·欣克教授和她的同事们研究了薄膜生长过程中台阶的运动，以及在这些台阶缺陷处分子的吸附和反应。在化学部的分析和表面化学计划和材料研究部的固态化学计划的支持下，这些衍射探针与扫描隧道显微镜的真实空间结构探针相结合，提供了台阶边缘的反应和扩散模型，主要是在铝薄膜表面上。从原子来源生长这些薄膜，以及从三甲胺丙烷等有机金属前驱体化学气相沉积铝，以期开发关于生长过程的重要技术信息。电子器件的制造涉及在不同衬底上生长金属薄膜。这种生长过程通常由表面上台阶状边缘缺陷的存在所控制。这项研究项目获得了关于这些台阶边缘缺陷的性质和动力学的基本信息，并评估了它们在薄膜材料生长中的作用。这项基础性工作与微电子设备制造的重要技术领域有着明确的联系。

This research project is concerned with the role of step and edge defects on the chemistry and growth of metal thin films. Using elastic and inelastic helium atom scattering methods, combined with spot profile anaylsis low energy electron diffraction studies, Professor Barbara J. Hinch and her coworkers at Rutgers University examine the motion of steps during thin film growth, and the adsorption and reaction of molecules at these step defects. With the support of the Analytical and Surface Chemistry Program in the Division of Chemistry and the Solid State Chemistry Program in the Division of Materials Research, these diffraction probes combined with the real space structural probe of scanning tunneling microscopy to provide models for the reaction and diffusion of step edges, primarily on aluminum thin film surfaces. Growth of these films from atomic sources as well as the chemical vapor deposition of aluminum from organometallic precursors such as trimethylamine alane is explored, with a view to developing technologically important information about the growth process.The fabrication of electronic devices involves the growth of thin films of metals on various substrates. This growth process is often controlled by the presence of step edge defects on the surface. This research project obtains fundamental information about the nature and dynamics of these step edge defects, and assesses their role in the growth of thin film materials. This fundamental work has a clear connection to technologically important areas of microelectronic device fabrication.