SBIR Phase I: Randomly Textured Nanoscale Surfaces for Silicon Solar Cells

这一阶段的小企业创新研究项目旨在通过增强多晶硅太阳能电池的光吸收和提高效率来提高低成本多晶硅太阳能电池的效率。传统的几何织构方案不适用于多晶硅。我们提出了一种使用反应离子刻蚀技术的无掩膜随机纳米级织构技术。这项技术已经被证明可以将绝对光谱反射率从350-1000 nm的光谱区域降低到1%以下，面积约130 cm2。纳米级织构由20-50 nm线宽特征组成，增强吸收是基于物理光学机制。这项研究旨在优化纳米级织构和表面钝化，以优化太阳能电池的性能。来自这些表面的太阳能电池有望提高多晶硅的效率。潜在的应用还包括发光器件和场发射器件。

This Phase I Small Business Innovation Research project is designed to improve the efficiency of low-cost multi-crystalline Silicon solar cells by enhancing their light absorption and improving their efficiency. Conventional geometrical texturing schemes are not applicable to multi-crystalline Silicon. We propose a maskless random nanoscale texturing technique using reactive ion etching techniques. This technique has been demonstrated to reduce absolute spectral reflection to less than one percent from the 350-1000 nm spectral region over ~ 130 cm2 areas. The nanoscale texture consists of 20-50-nm linewidth features, and enhanced absorption is based on a physical optics mechanism. The proposed research is aimed at optimization of nanoscale texture and surface passivation for optimized solar cell performance. Solar cells from these surfaces are expected to improve multi-crystalline Silicon efficiency. Potential applications also include Light Emitting Devices and field emission devices.