CAREER: Reactive Radical Interactions with Clean and Adsorbate Covered Semiconductor Surfaces

这个CAREER项目由分析和表面化学项目支持，研究活性自由基与表征良好的半导体表面的详细相互作用。利用分子束散射方法，将研究高温离子和自由基与Si（100）和Si（111）表面的相互作用。转动转向对卤素间反应物的影响、反应中的化学选择性、原子提取过程和吸附层的反应将被研究，以深入了解这些对半导体加工具有重要意义的反应。为了提高对当前技术及其应用的理解，将制定一项计划，让高中教师参与与该项目相关的基础研究。该项目将通过在夏季参与尖端研究来影响高中教师和学生，并在整个学年开展课堂活动。小型活性离子和自由基与半导体表面的基本相互作用构成了本CAREER项目的研究基础。让当地高中教师在夏季参与基础研究工作，并在学年期间延伸到他们的教室，形成了其教育基础。分子束散射方法与硅表面的光谱表征相结合，将使内华达大学里诺分校的肖恩·凯西教授的研究小组能够研究这些表面反应的基本原理，这些反应对半导体加工领域具有重要意义。

This CAREER project, supported in the Analytical and Surface Chemistry Program, addresses the detailed interactions of reactive radicals with well characterized semiconductor surfaces. Using molecular beam scattering methods, the interaction of hyperthermal ions and radicals with the Si(100) and (111) surfaces will be examined. Effects of rotational steering in interhalogen reactants, chemical selectivity in the reactions, atom abstraction processes, and reactions with adsorbed layers will be studied to provide insight into these reactions of fundamental importance to semiconductor processing. A program will be developed to include high school teachers in the basic research associated with this project, in order to foster increased understanding of current technology and its application. This program will impact high school teachers and their students through participation in cutting edge research during the summers, and follow up with classroom activities throughout the school year. The fundamental interactions of small reactive ions and radicals with semiconductor surfaces forms the research basis of this CAREER project. Involving local high school teachers in the basic research effort during summers, and outreach to their classrooms during the academic year, forms its educational basis. Molecular beam scattering methods coupled with spectroscopic characterization of silicon surfaces will allow the research group of Professor Sean Casey at the University of Nevada-Reno to examine the fundamentals of these surface reactions which are of significant importance to the area of semiconductor processing.