Establishing an IUCRC Center for Microcontamination Control at Northeastern University: a Planning Meeting Proposal

拟议的中心的目标是开发最先进的技术，用于制造和制造过程中的微和纳米级污染控制，去除和表征。 该中心将有助于提高半导体、信息技术、制药、成像、航空航天和其他受颗粒和离子污染影响的行业的竞争力。 该中心将特别专注于图案化，结构化和平面基板的表面清洁。 该中心的教师已经确定了有效清除图案化晶片上离子污染的机制。

The proposed center's goal is to develop state of the art techniques for micro and nanoscale contamination control, removal and characterization in manufacturing and fabrication processes. The center will contribute to the competitiveness of the semiconductor, information technology, pharmaceutical, imaging, aerospace and other industries affected by particulate and ionic contamination. The center will especially focus on surface cleaning of patterned, structured and flat substrates. Faculty in the center have identified mechanisms to effectively clean ionic contamination from patterned wafers.