NIRT: Motion control platform for accurate measurement and manufacturing of nanostructures

本提案是对NSF 01-157 NIRT类纳米科学与工程倡议的响应。纳米级定位和控制技术对于纳米技术研究仪器和专门用于制造和测试纳米器件的工具都是必不可少的，但几乎没有稳健和可重复的解决方案。为了实现宏观上有用的系统的制造，必须具有几何精度和精度的机构，以促进从纳米科学到生产性纳米技术的过渡。这对于复杂形状机构的多工序制造和组装尤其重要。该项目的目标是生产一种便携式和精确的样品/探头运动仪器，能够在长时间内以纳米级进行操作。这项工作的输出将是一种紧凑和高度集成的仪器，能够在50 mm x 50 mm的完整扫描区域上重复定位硅片等宏大小对象，并返回到指定位置，从而能够观察包含纳米大小对象的过程，并能够进行多组件组装。该仪器将使纳米分辨率工具能够专注于放置在仪器操作范围内任何地方的纳米设备，用于压印光刻、光刻自组装、纳米线电路和复杂的多工艺和多尺度组装。这一发展将为所有领域的纳米技术研究提供设施，在现有技术能力的极限下进行基本测量是一个问题，特别是在生物力学、纳米电子学和纳米机械领域。将在仪器系统开发期间，以及通过后续项目和基于已开发设施的研究生指导，在新兴的纳米技术应用仪器和机械设计领域对未来工程师进行培训。还设想将纳米机械设计的体系结构知识纳入研究生的精密机械设计课程。一门名为“纳米技术的机械系统”的新研究生课程目前正在开发中，将于2002年秋季学期开课。此外，还将开发一个项目网站，其中将包括与该项目有关的后勤和技术讨论网页的链接以及与相关网站的链接。作为我们对K-12社区的延伸的一部分，将有一个部分提供针对高中水平读者的这项工作的概述。

This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 01-157, category NIRT. Nano-scale positioning and control technology will be essential both for nanotechnology research instrumentation and for tools dedicated to fabrication and testing of nano-devices, but few, if any, robust and reproducible solutions exist. To realize manufacture of macroscopically useful systems, it is necessary to have mechanisms with geometric precision and accuracy to facilitate the transition from nano-science to productive nanotechnology. This will be particularly important for multi-process manufacture and assembly of complexly shaped mechanisms. The objective of this project is to produce a portable and accurate instrument for sample/probe motion that is capable of performing at nanometer levels over protracted time periods. The output of this work will be a compact and highly integrated instrument, capable of reproducibly positioning a macro-sized object such as a silicon wafer over the complete scan area of 50 mm x 50 mm and return to a specified position thereby enabling observations of processes containing nanometer-sized objects as well as the ability to 'pick and place' for multi-component assembly. The instrument would enable nanometer resolution tools to focus on a nano-device placed anywhere over the instruments operating range for applications such as imprint lithography, lithographic self assembly, nanowire circuitry and complex multi-process and multi-scale assemblies. This development will provide a facility for nanotechnology studies in all fields for which fundamental measurements at the limits of current technological capability are an issue, in particular, in the fields of bio-mechanics, nano-electronics and nano-mechanics. Training of future engineers in the emerging field of instrument and machine design for nanotechnology applications will take place both during the development of the instrumentation systems and through subsequent projects and graduate instruction based around the developed facility. It is also envisaged that knowledge of architectures for nanometer mechanism design will be incorporated into graduate precision machine design courses. A new graduate course titled 'Mechanical systems for nanotechnology' is currently being developed and will be offered in the 2002 fall semester. Additionally, a project web-site will be developed that will include links to logistical and technical discussion pages specific to this project as well as links to related sites. As part of our outreach to the k-12 community there will be a section providing an overview of this work aimed towards high school level readership.