Infrared Band-Specific Near Field Optical Microscopy Probing of Chemically Amplified Polymer Photoresists

该项目将使用红外近场扫描光学显微镜(IR NSOM)探索酸催化、化学放大的深紫外光抗蚀剂中的机理、线尺寸和酸扩散速率。其目标是(1)开发一种更高分辨率的可调谐激光红外近场扫描光学显微镜，(2)将空间分辨率极限提高到10 nm，(3)使用该方法研究深紫外光化学放大聚合物光刻胶中最先进的光刻产生线的样品，以及(4)探索酸物种的扩散特性。IR NSOM是一种特定于化学波段的光学表征技术，它为研究特征和线尺寸提供了一种适用的方法。它可以应用在许多场合，以及随着新的化学成分被引入聚合物化学中，用于更小线条尺寸的深紫外光刻应用。这种对比机理的基础是，聚合物薄膜在紫外光照射前后和曝光后烘烤后的吸收特征在红外振动带上表现出明显的波长特性变化。当在吸收和折射率变化方面适当考虑对比度时，该方法提供了一种在纳米尺度上检测化学变化的高度灵敏的方法。特定波长的红外NSOM有望为表征谱线尺寸和定量研究酸扩散速率提供一条重要的新途径。%该项目解决了材料科学中具有高度技术相关性的主题领域的基础研究问题。新的实验工具现在可以用来实现基本化学和扩散过程的高分辨率，如果更好地了解这些过程，就可以推动基础材料科学和技术的进步。从研究中获得的基本知识和理解有望有助于提高为先进器件和电路以光刻方式定义更小和更高分辨率元件的能力。该计划的一个重要特点是通过在一个具有根本意义和技术意义的领域对学生进行培训，将研究和教育结合起来。

This project will explore mechanisms, line dimensions, and acid diffusion rates in acid catalyzed, chemically amplified deep ultraviolet (UV) photoresists using infrared near field scanning optical microscopy(IR NSOM). The objectives are to (1)develop a higher resolution variant of tunable laser infrared near field scanning optical microscopy, (2)push the limits of spatial resolution to 10 nm, (3)use the method to study state-of-the-art samples of photolithographically generated lines in deep-UV chemically amplified polymer photoresists, and (4) to probe the diffusion properties of the acid species. IR NSOM is a chemically band-specific optical characterization technique that offers an adaptable method to study features and line dimensions. It can be applied in many situations and as new chemical components are introduced into polymer chemistries for deep-UV lithographic applications for smaller line dimensions. The basis for the contrast mechanism is that the absorption features in the polymer films before and after UV exposure and post exposure bake show dramatic wavelength-specific changes in infrared vibrational bands. When the contrast is properly accounted for with regard to both absorption and index of refraction changes, the method provides a highly sensitive way of detecting chemical transformations on a nanoscopic scale. Wavelength-specific IR NSOM is expected to provide an important new route to characterize line dimensions and to study acid diffusion rates quantitatively. %%%The project addresses basic research issues in a topical area of materials science with high technological relevance. New experimental tools are now becoming available to allow high resolution of elementary chemical and diffusion processes which when better understood allow advances in fundamental materials science and technology. The basic knowledge and understanding gained from the research is expected to contribute to improving the ability to lithographically define smaller and higher resolution components for advanced devices and circuits. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area.***