NIRT: Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of Materials

国家科学基金会摘要PI名称：Oehrlein，Gottlieb S.机构：马里兰大学提案编号：0506988 NIRT：纳米技术制造：为材料的等离子体/高能束模板设计的纳米结构聚合物该提案是响应NSF 04-043，类别NIRT的纳米尺度科学与工程倡议而收到的。 拟议的研究的目的是建立一个原子的理解与图案转移过程中使用的等离子体和高能束的纳米结构聚合物的相互作用，并确定所需的分子设计参数和等离子体处理参数，以控制图案在纳米尺度。这一提议的一个强烈动机是认识到，基于软光刻和自组装的新兴纳米光刻方法的有机材料的分子设计不受短光波长下透明度要求的约束。这种深刻的变化提供了设计有机掩蔽材料的机会，以大大提高等离子体环境中的稳定性。该方法将汇集一个由学术和工业研究人员组成的跨学科团队，通过他们的综合专业知识和研究能力，他们能够显著推进材料受控纳米级图案化的前沿。这包括有机成像材料的设计和合成;使用软光刻和自组装对材料进行纳米结构化，将有机分子暴露于高度受控和良好表征的等离子体环境和高能束，以及表征和模拟由这些相互作用引起的化学，结构和形貌的变化。项目任务的成功完成将使新的纳米成像材料的设计与增强等离子体/高能束环境中的化学和结构稳定性，并将导致先进的等离子体设备\工艺的发展。这些是在纳米尺度上控制材料精确图案化的先决条件，这是未来纳米技术制造的关键基础之一。跨学科的特点和相互依赖的各种研究任务，沿着与大学产业合作的这个NIRT项目提供了独特的教育机会，为学生，博士后研究员，教师和工业研究人员参与，并将被用来提高教室为基础的教学。

National Science FoundationABSTRACTPI name: Oehrlein, Gottlieb S.Institution: University of MarylandProposal Number: 0506988NIRT: Nanotechnological Manufacturing: Nanostructured Polymers Designed for Plasma/Energetic Beam Templating of MaterialsThis proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NIRT. The objective of the proposed research is to establish an atomistic understanding of the interactions of nanostructured polymers with the plasmas and energetic beams used during pattern transfer, and to identify the molecular design parameters and plasma processing parameters required to control patterning at nanoscale dimensions. A strong motivation for this proposal is the recognition that molecular design of organic materials for emerging nanolithographic approaches based on soft lithography and self-assembly is not constrained by the requirement for transparency at short optical wavelengths. This profound change provides the opportunity to design organic masking materials for greatly enhanced stability in plasma environments. The approach is to bring together an interdisciplinary team of academic and industrial researchers, who, through their combined expertise and research capabilities are positioned to significantly advance the cutting edge of controlled nanoscale patterning of materials. This includes design and synthesis of organic imaging materials; nanostructuring the materials using soft lithography and self-assembly, exposing the organic molecules to highly controlled and well-characterized plasma environments and energetic beams, and characterizing and simulating the changes of the chemistry, structure and topography induced by these interactions. Successful completion of the project tasks will enable design of new nanoscale imaging materials with enhanced chemical and structural stability in plasma/energetic beam environments and will lead to the development of advanced plasma equipment\processes. These are prerequisites to controlled precision patterning of materials at the nanoscale, which is one of the critical foundations of future nanotechnological manufacturing. The interdisciplinary character and inter-dependence of the various research tasks along with the university-industry collaboration of this NIRT project provide unique educational opportunities for the students, post-doctoral fellows, faculty and industrial researchers involved, and will be used to enhance class-room based teaching.