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NER: Expanding the Limits of Nanofabrication with Extreme Ultraviolet Light - (Theme: Manufacturing Processes at the Nanoscale)

NER: Expanding the Limits of Nanofabrication with Extreme Ultraviolet Light - (Theme: Manufacturing Processes at the Nanoscale)
NER:用极紫外光扩展纳米制造的极限 -(主题:纳米尺度的制造工艺)
批准号:
0508484
负责人:
Mario Marconi
金额:
$9.96万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2005
资助国家:
美国
项目状态:
已结题
起止时间:
2005-08-01 至 2007-07-31

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中文摘要
翻译
该提案是对NSF 04-043类纳米科学与工程倡议的响应。这项研究的目的是展示一种验证原理的纳米刻蚀过程,能够使用紧凑型台式激光器在短波长(大约比可见光短10到50倍)下写入各种动机的纳米级特征的周期性图案。将采用的方法是多光束干涉光刻。该方法将利用这些激光器的相干特性,通过干涉产生不同动机的周期性光图案,用于在光刻胶上写入。通过进一步的加工,这些图案将被转移到感兴趣的衬底上,如陶瓷或半导体,以实现功能器件。这项拟议的研究具有重要意义,因为它有望实现一种前所未有的分辨率的纳米图案化方案,从而将激光制造扩展到到目前为止只有大型同步加速器设施才能获得的波长。此外,它还承诺实现一种多功能的桌面图案工具,该工具可以很容易地与实验室环境中的其他加工工具集成在一起。这种工具将能够设计出特征尺寸可控的坚固模板,用于数据存储的人工工程纳米级磁性材料的生长,以及用于光波技术的纳米级半导体和亚波长光学材料的生长。它还将影响生物科学,提供固定蛋白质的支架,并排列DNA链或分子,从而使新的传感和诊断工具成为可能。拟议的研究也将为培养学生创新和前瞻性的纳米技术提供独特的机会。该项目的研究和教育机会相结合,将极大地惠及美国的纳米科学和纳米技术倡议,这些倡议反过来又直接影响到电子、生物、医学、储能和材料科学等领域,最终造福社会。
英文摘要
This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NER. The objective of this research is to demonstrate a proof-of-principle nanopatterning process with the capability to write periodic patterns of nanometer-scale features of a variety of motives using compact table-top lasers emitting at short wavelengths, about 10 to 50 times shorter than visible light. The approach that will be pursued is multiple beam interferometric lithography. The method will exploit the coherence characteristics of these lasers to generate by interference periodic light patterns of different motives that will be used to write on photoresist. Through further processing these patterns will be transferred to substrates of interest such as ceramics or semiconductors to realize functional devices. The proposed research is significant as it promises to realize a nano-patterning scheme of unprecedented resolution thereby extending laser manufacturing to wavelengths only available until now at large synchrotron facilities. Furthermore, it promises the realization of a versatile table-top patterning tool that could easily be integrated with other processing tools in a laboratory environment. Such tool will enable the engineering of robust templates of controlled feature size for applications such as the growth of artificially engineered nanoscale magnetic materials for data storage, and nanoscale semiconducting and sub-wavelength optical materials for lightwave technologies. It will also impact the biological sciences, by providing scaffolds to immobilize proteins, and arrange DNA strands or molecules thereby enabling novel sensing and diagnostic tools. The proposed research will also offer unique opportunities for the training of students in an innovative and forward looking nano-technology. The combined research and education opportunities of this project will greatly benefit the US nanoscience and nanotechnology initiatives, which in turn have direct impact on electronics, biology, medicine, energy storage and material science among other fields, ultimately beneficiating society.
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Collaborative Research: Defect-free nanofabrication of plasmonic structures
  • 批准号:
    1507907
  • 项目类别:
    Standard Grant
  • 资助金额:
    $23.64万
  • 财政年份:
    2015
  • 负责人:
    Mario Marconi
  • 依托单位:
Table top EUV holography: a new approach for versatile nanolithography
  • 批准号:
    0901806
  • 项目类别:
    Standard Grant
  • 资助金额:
    $32.98万
  • 财政年份:
    2009
  • 负责人:
    Mario Marconi
  • 依托单位:
海外基金