Table top EUV holography: a new approach for versatile nanolithography

桌面 EUV 全息术：多功能纳米光刻的新方法

• 批准号: 0901806
• 负责人: Mario Marconi
• 金额: $ 32.98万
• 依托单位: Colorado State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-07-01 至 2013-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0901806&HistoricalAwards=false
• 关键词: Table; top; EUV; holography; new

"This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." The objective of this research is to demonstrate a new table top photolithography scheme capable to print sub-50 nm features. The approach is based on projection holographic lithography, consisting of printing photoresist with the reconstructed image of a computer-designed digital holographic mask. The illumination source is a highly coherent table-top extreme ultraviolet (EUV) laser.The project is significant as it promises to realize a nano-patterning scheme with nano-scale resolution thereby extending laser manufacturing to wavelengths only available until now at large synchrotron facilities. The holography projection lithography approach will allow printing in a matter of seconds patterns with arbitrary motives. Since the pattern smallest feature is mainly determined by the wavelength of the illumination, which for the table top EUV lasers used in this project ranges from 47 to 13 nm, the proposed scheme promises writing resolution in the few tens of nanometers.This project will have a broader impact in education through the training of graduate students in an innovative technology that combines optical engineering and metrology, laser design and material science. The proposed research also will provide exciting learning opportunities for undergraduate students through summer internships organized every year in CSU. The implementation of the proposed nanopatterning scheme will impact other areas of nanoscience and technology, including the development on nano-structured materials, nano-photonics, plasmonic structures, etc.. It promises the realization of a table-top patterning tool with similar capabilities as large synchrotron facilities that could be integrated with other processing tools in a small laboratory environment.

“该奖项是根据2009年美国复苏和再投资法案（公法111-5）资助的。“这项研究的目的是展示一种新的桌面光刻方案，能够打印亚50纳米的功能。 该方法是基于投影全息光刻，包括印刷光刻胶与计算机设计的数字全息掩模的重建图像。 照明光源是高度相干的台式极紫外（EUV）激光器。该项目意义重大，因为它有望实现具有纳米级分辨率的纳米图案化方案，从而将激光制造扩展到迄今为止只有大型同步加速器设施才能提供的波长。 全息投影光刻方法将允许在几秒钟内打印具有任意动机的图案。由于图案的最小特征主要由照明波长决定，该项目中使用的桌面EUV激光器的照明波长范围为47至13 nm，因此所提出的方案有望实现几十纳米的写入分辨率。该项目将通过培养研究生，在创新技术方面产生更广泛的影响，该技术将光学工程和计量学相结合，激光设计和材料科学。拟议的研究还将通过每年在CSU组织的暑期实习为本科生提供令人兴奋的学习机会。拟议的纳米图案化计划的实施将影响纳米科学和技术的其他领域，包括纳米结构材料、纳米光子学、等离子体结构等的发展。它承诺实现一个桌面图形化工具与大型同步加速器设施，可以与其他处理工具集成在一个小的实验室环境中类似的能力。