49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication; Orlando, Florida

该奖项提供支持研究生参加第49届国际会议电子，离子和光子束技术和纳米纤维，2005年，将在奥兰多，佛罗里达，2005年5月31日至6月3日举行。 在纳米纤维、微细加工、电子和离子光刻、X射线和压印光刻、粒子束光学和纳米纤维的前沿应用领域，本次会议是卓越的。所要求的旅行援助将使学生能够向高水平的国际科学界展示他们的研究。 他们将观察科学家和工程师如何在会议上交换想法和信息，他们将听到纳米技术最新研究成果的第一手介绍。他们将建立个人联系并了解就业机会。在一个特殊的学生早餐，会议组织者将向学生描述会议计划是如何放在一起。

This award provides support to graduate students to attend the 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2005, to be held in Orlando, Florida, May 31 to June 3, 2005. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent.The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they'll hear first-hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the students how the conference program is put together.