MRI2009:Acquisition of a Next Generation Electron Beam Lithography System with Molecular Scale Precision for Research and Education
MRI2009:Acquisition of a Next Generation Electron Beam Lithography System with Molecular Scale Precision for Research and Education
批准号:
0922836
负责人:
Donald Tennant
金额:
$77.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-09-15 至 2013-08-31
中文摘要
本研究的目的是为纳米结构在可与分子长度尺度相媲美的尺度上的控制模式提供使能的仪器。该方法是获得下一代高压电子束光刻仪器,其精度和准确度超过了当前的限制。电子束光刻设备采用数字控制的电子束来直接塑造纳米级的图案。新水平的速度、放置精度、覆盖和稳定性将允许在10纳米以下长度尺度上实现分辨率和控制,从而在以下领域实现科学和技术突破:通信、高密度计算机存储、医疗保健诊断、低成本电子产品和能源研究和产品。该奖项将把先进的图案化设备放置在康奈尔纳米科学和技术设施,每年将有数百名研究人员开放使用。该奖项的更广泛影响来自CNF?美国在纳米技术教育、指导、人力资源和经济发展方面发挥积极和坚定的作用。CNF工作人员每年为700多名用户举办1000多次关于个人设备的团体培训。CNF的工作人员教授半年一次的纳米技术实验室课程,组织专门为电子束光刻从业者举办的讲习班,并将开发一个先进的电子束培训模块。CNF每年夏天赞助和接待20多名专注于纳米技术研究的本科生研究人员。CNF REU项目特别针对女性,代表性不足的少数民族,以及很少或没有研究经验的学生。此外,CNF为实验室资源有限的小型创新型公司提供了重要的技术支持,从而带来了重大的经济发展机会。
英文摘要
The objective of this research is to provide enabling instrumentation for controlled patterning of nanostructures at dimensions comparable to molecular length scales. The approach is to acquire a next generation high voltage electron beam lithography instrument that exceeds the current limits of precision and accuracy.Electron beam lithography equipment employs a digitally controlled beam of electrons to directly shape nanoscale patterns. The new level of speed, placement accuracy, overlay, and stability will allow resolution and control on the sub-10 nm length scale enabling scientific and technological breakthroughs in sectors that include: communications, high density computer storage, health care diagnostic, low cost electronics, and energy research and products. This award will place advanced patterning equipment at the Cornell NanoScale Science and Technology Facility where it will be openly accessed by hundreds of researchers annually. Broader impacts of this award devolve from CNF?s active and committed role in nanotechnology education, mentorship, human resources and economic development. CNF staff conduct over a thousand group training sessions on individual equipment for over 700 users annually. CNF staff teach semi-annual nanotechnology laboratory courses, organize workshops specifically for practitioners of e-beam lithography and will develop an advanced e-beam training module. CNF sponsors and hosts over 20 undergraduate researchers each summer focusing on nanotechnology research. The CNF REU program particularly targets women, underrepresented minorities, and students with little or no prior research experience. In addition, CNF provides significant technology support to small innovative companies with limited laboratory resources, resulting in significant economic development opportunities.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Gordon Research Conference on the Chemistry and Physics of Microstructure Fabrication, July 27-31, 1992, Meriden, NH
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批准号:9209718
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项目类别:Standard Grant
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资助金额:$0.43万
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财政年份:1992
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负责人:Donald Tennant
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依托单位:
海外基金