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GOALI: Chemical Design and Electrochemical Process Engineering for Micro-Fabrication

GOALI: Chemical Design and Electrochemical Process Engineering for Micro-Fabrication
目标:微制造的化学设计和电化学工艺工程
批准号:
0930107
负责人:
Dale Barkey
金额:
$34.5万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2009
资助国家:
美国
项目状态:
已结题
起止时间:
2009-08-01 至 2012-07-31

项目摘要

项目成果

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中文摘要
翻译
0930107 Barkey该GOALI提案将与Rohm和哈斯电子材料有限责任公司合作实施,将推进电沉积的科学和工程,用于制造微型器件和组件,包括微型机械,无源电子器件和电子互连。含添加剂的酸性硫酸盐镀铜液的多功能化学性质使其成为广泛的微加工和电子封装应用的理想选择。这项工作是基于添加剂,铜(I)和溶解氧之间的相互作用的核心作用。后两种物种的局部浓度可以通过脉冲反向电流产生Cu(I)和气体扩散器引入氧气等步骤来动态控制。PI在硅通孔填充中成功地实现了这些想法。这项工作的目的是扩大通过芯片填充能力,并扩展该过程,以包括额外的制造任务,包括通过限制开口的内部凹陷的涂层,并通过掩模系统中的腔体的填充,其中电解质被限制在由阳极,基板和掩模界定的微观体积。这项工作将包括真实的制造过程的实验室和试点规模,以及合成化学,电分析研究和过程建模。这项工作将带来一个全面的反应工程的角度来看,这个问题,并超越了传统的电流分布的理解更简单的电镀工艺。更广泛的影响:该GOALI项目将与Rohm and哈斯电子材料有限责任公司合作,通过其位于纽约自由港的工厂进行。该研究将使微制造和半导体器件制造的进步具有潜在的经济和社会效益,包括美国高科技制造经济的增长,基于密集垂直半导体封装的新消费品以及基于微器件的生物医学工程的进步。此外,该奖项将支持UNH PI和Co-PI的努力,使本科生参与有意义的研究项目。PI继续进行的招聘工作包括访问地区高中和参加新生环境工程讲座。UNH的化学工程系成功地在其项目中招募和留住了妇女和代表性不足的少数民族。在过去的三年里,PI支持了四名本科生研究人员,包括非洲裔美国人和越南裔美国人。目前项目的预算将包括每年支持四名本科生,PI将尽一切努力从代表性不足的群体中招募学生参加该项目。PI曾担任罗纳德E的导师。McNair Post-Baccalaureate Achievement Program是由1965年高等教育法案第四章资助的TRIO计划之一。该计划旨在鼓励来自经济困难和种族多样化背景的学生考虑和准备研究生学习和研究。PI打算继续在这个项目中服务,并使他的实验室可用于麦克奈尔研究员的研究项目。
英文摘要
0930107BarkeyThis GOALI proposal, to be carried out in partnership with Rohm and Haas Electronic Materials LLC, will advance the science and engineering of electrodeposition for fabrication of micro-devices and components including micro machines, passive electronic devices and electronic interconnects. The versatile chemistry of the acid-sulfate copper plating bath with additives makes it ideal for a broad class of micro-fabrication and electronics packaging applications. The work is based on the central role of interactions among additives, Cu(I) and dissolved oxygen. The local concentration of the latter two species can be controlled dynamically through such steps as pulse-reverse current to generate Cu(I) and gas diffusers to introduce oxygen. These ideas have been successfully implemented by the PI in filling of through-silicon vias. This work is intended to expand through-chip filling capabilities and to extend the process to encompass additional fabrication tasks, including the coating of interior recesses through restricted openings, and the filling of cavities in through-mask systems where the electrolyte is confined to a microscopic volume bounded by anode, substrate and mask. The work will encompass real fabrication processes on both bench and pilot scales as well as synthetic chemistry, electroanalytical studies and process modeling. This work will bring a comprehensive reaction-engineering perspective to the problem and advance beyond the conventional current-distribution understanding of simpler electroplating processes. Broader Impacts: This GOALI project will be carried out in partnership with Rohm and Haas Electronic Materials LLC through its facility in Freeport, NY. The research will enable advances in micro-fabrication and semi-conductor device manufacture with potential economic and societal benefits that include growth in the US high-tech manufacturing economy, new consumer products based on dense vertical semi-conductor packaging and advances in biomedical engineering based on micro-devices. In addition, the award will support the efforts of the UNH PI and Co-PI to engage undergraduate students in meaningful research projects. Continuing recruitment efforts by the PI include visits to area high schools and participation in the freshman environmental engineering lectures. The Chemical Engineering Department at UNH has been successful in recruiting and retaining women and underrepresented minorities in its program. In the past three years, the PI has supported four undergraduate researchers, including African-American and Vietnamese-American NH residents. The budget for the current project will include support for four undergraduate students per year, and the PI will make every effort to recruit students from under-represented groups into the project. The PI has served as a Mentor in the Ronald E. McNair Post-Baccalaureate Achievement Program, one of the TRIO Programs funded by Title IV of the Higher Education Act of 1965. The program is designed to encourage students from economically challenged and racially diverse backgrounds to consider and prepare for post graduate study and research. The PI intends to continue to serve in this program and to make his lab available for research projects by McNair Fellows.
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会议论文
GOALI: Synthesis, Composition and Thermal Properties of Metal Nano-Particles for Printable Conductive Media
  • 批准号:
    1200544
  • 项目类别:
    Standard Grant
  • 资助金额:
    $45.0万
  • 财政年份:
    2012
  • 负责人:
    Dale Barkey
  • 依托单位:
Microscopic Dynamics of Roughening in Copper Electroplating
  • 批准号:
    9815067
  • 项目类别:
    Standard Grant
  • 资助金额:
    $18.33万
  • 财政年份:
    1999
  • 负责人:
    Dale Barkey
  • 依托单位:
Atomic Force Microscopic and Ring Disk Voltammetric Studies on the Role of Chloride and Oxygen in Copper Electroplating
  • 批准号:
    9622634
  • 项目类别:
    Standard Grant
  • 资助金额:
    $3.13万
  • 财政年份:
    1996
  • 负责人:
    Dale Barkey
  • 依托单位:
Conductive-Polymer Filaments for Sensors
  • 批准号:
    9520168
  • 项目类别:
    Standard Grant
  • 资助金额:
    $5.0万
  • 财政年份:
    1995
  • 负责人:
    Dale Barkey
  • 依托单位:
国内基金
海外基金
Chinese Journal of Chemical Engineering
  • 批准号:
    21224004
  • 项目类别:
    专项基金项目
  • 资助金额:
    20.0万元
  • 批准年份:
    2012
  • 负责人:
    廖叶华
  • 依托单位:
Chinese Journal of Chemical Engineering
  • 批准号:
    21024805
  • 项目类别:
    专项基金项目
  • 资助金额:
    20.0万元
  • 批准年份:
    2010
  • 负责人:
    廖叶华
  • 依托单位: