SBIR Phase II: Enabling Large-Scale Manufacturing of Organic Electronic Devices Using Photolithography
SBIR Phase II: Enabling Large-Scale Manufacturing of Organic Electronic Devices Using Photolithography
批准号:
1058509
负责人:
John DeFranco
金额:
$49.98万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-04-01 至 2015-09-30
中文摘要
这个小型企业创新研究(SBIR)第二阶段项目旨在开发一种光致抗蚀剂系统,该系统与比传统光致抗蚀剂更广泛的材料兼容,允许在现有的光刻设备上对先进的半导体聚合物和小分子进行图案化。通过第一阶段项目,正交改进了其氟化光刻胶系统,使两种新材料的制造成本更低,性能更强。在这个第二阶段的项目中,广泛使用的导电聚合物聚(3,4-乙撑二氧噻吩):聚(苯乙烯磺酸)(PEDOT:PSS)和类似的酸性材料的图案化将被研究。将采取多种方法来不断提高新的光致抗蚀剂材料的性能。将通过解决可能对规模化具有挑战性的主要问题来研究一种或两种光致抗蚀剂材料的大批量可扩展性,包括处理热生成和寻找合适的引发剂。该项目的更广泛/商业影响将是通过利用当前行业中使用的现有光刻胶基础设施来实现有机电子器件的大规模制造的潜力。新的光致抗蚀剂材料的大量和一致的质量的可用性将有助于满足有机电子工业的性能和数量需求,一旦可扩展和高产量的制造技术可用,预计有机电子工业将迅速增长。
英文摘要
This Small Business Innovation Research (SBIR) Phase II project aims to develop a photoresist system that is compatible with a much wider range of materials than traditional photoresists, allowing for the patterning of advanced semiconducting polymers and small molecules on existing photolithographic equipment. Through Phase I project, Orthogonal has improved its fluorinated photoresist system by making two new materials with lower manufacturing cost and enhanced performance. In this Phase II project, the patterning of the widely used conductive polymer poly(3,4-ethylene dioxythiophene):poly(styrene sulfonic acid) (PEDOT:PSS) and similar acidic materials will be studied. Multiple approaches will be taken to continuously improve the performance of the new photoresist materials. The scalability of one or both photoresist materials to large quantities will be investigated by addressing the major issues that may be challenging to the scale-up, including dealing with heat generation and finding a suitable initiator.The broader/commercial impacts of this project will be the potential to enable the large-scale manufacturing of organic electronic devices by leveraging the existing photolithographic infrastructure currently used in the industry. The availability of the new photoresist materials in large quantities and consistent quality will help meet the performance and volume demands of organic electronic industry, which is expected to grow rapidly once a scalable and high-yield manufacturing technique is available.
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SBIR Phase II: Flexible Organic Circuits with Photolithography for eReader Applications
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批准号:1230454
-
项目类别:Standard Grant
-
资助金额:$50.0万
-
财政年份:2012
-
负责人:John DeFranco
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依托单位:
SBIR Phase I: Organic/Inorganic Hybrid Circuits on Film using Photolithography
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批准号:1047030
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项目类别:Standard Grant
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资助金额:$14.99万
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财政年份:2011
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负责人:John DeFranco
-
依托单位:
SBIR Phase I: Enabling large-scale manufacturing of organic electronic devices using photolithography
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批准号:0945700
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2010
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负责人:John DeFranco
-
依托单位:
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