SNM: Development of Ink-Jet Based Low Cost Roll-to-Roll Nanopatterning (i-R2R Nano) with Demonstration in Thin Film Photovoltaics
SNM: Development of Ink-Jet Based Low Cost Roll-to-Roll Nanopatterning (i-R2R Nano) with Demonstration in Thin Film Photovoltaics
批准号:
1120823
负责人:
S. Sreenivasan
金额:
$130.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2011
资助国家:
美国
项目状态:
已结题
起止时间:
2011-09-15 至 2016-08-31
中文摘要
研究目标和方法:可伸缩纳米制造(SNM)奖的总体研究目标是开发高速、基于喷墨的卷对卷纳米加工(I-R2R Nano),用于薄膜光伏(PV)等成本敏感型应用。具体目标包括:(I)研究自上而下(纳米印迹)和自下而上(纳米颗粒或嵌段共聚物)R2R纳米刻蚀;(Ii)开发高通量R2R工艺(50英尺/分钟)的使能技术,总图案化成本目标为2美元/平方米;以及(Iii)使用非周期性等离子体结构优化柔性衬底上纳米结构a-Si PV中的宽带光捕获,以获得显著提高的效率。智力价值:基础科学贡献将包括:(I)用于高速I-R2R系统和工艺的纳米流体、材料流变学、多尺度力学建模和实时传感/控制;(Ii)印记材料、溶剂型自组装材料的设计,以及用于TD和BU工艺中快速图案形成的接口;(Iii)用于在柔性基板上的薄膜PV中实现最佳捕光的新型材料集成和器件设计。更广泛的影响:这一跨学科项目将在低材料使用量的高速R2R纳米刻蚀领域创造基础知识,并为高效PV设计受控纳米结构。在R2R纳米粒子的各种潜在应用中,薄膜PVS代表了最苛刻的纳米尺度要求和成本限制。外展活动将促进创新/创业;并通过德克萨斯大学-奥斯汀工程T-REX计划促进本科生层面的协同活动。
英文摘要
Research Objectives and Approaches: The overall research objective of this Scalable NanoManufacturing (SNM) award is to develop high speed, ink-jet based roll-to-roll nanopatterning (i-R2R Nano) for cost-sensitive applications such as thin film photovoltaics (PVs). The specific objectives include: (i) Investigation of top-down (nanoimprint) and bottom-up (nanoparticle or block co-polymer) R2R nanopatterning; (ii) Development of enabling technologies for high throughput R2R processes (50 ft/min) with a total patterning cost target of $2/m2; and (iii) Optimization of broadband light trapping in nanostructured a-Si PVs on flex substrates using aperiodic plasmonic structures to obtain significantly enhanced efficiencies. Intellectual Merit: The basic scientific contributions will include: (i) Nano-fluidics, material rheology, multi-scale mechanics modeling, and real-time sensing/control for high-speed i-R2R systems and processes (ii) Design of imprint materials, solvent based self-assembly materials, and interfaces for rapid pattern formation in TD and BU processes; and (iii) Novel material integration and device design for optimum light trapping in thin film PVs on flex substrates. Broader Impacts: This interdisciplinary program will create fundamental knowledge in the areas of high-speed R2R nanopatterning with low material usage, and in the design of controlled nano-structures for high efficiency PVs. Thin film PVs is representative of the most demanding nano-scale requirements and cost constraints among the various potential applications of R2R nanopatterning. The outreach activities will promote innovation/entrepreneurship; and synergistic activities at the undergraduate level through the UT-Austin Equal Opportunity in Engineering T-REX program.
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会议论文
NSF-NextFlex Workshop on Accelerating Innovative Manufacturing Technology for Flexible Hybrid Electronics; San Jose, California; August 6-7, 2018
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批准号:1840406
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项目类别:Standard Grant
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资助金额:$3.05万
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财政年份:2018
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负责人:S. Sreenivasan
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依托单位:
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批准号:1160494
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资助金额:40万元
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批准年份:2020
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