Collaborative Research: Development of a Robust, High-Speed, High-Quality Laser-Assisted Nanomanufacturing System

该合作研究项目的重点是了解激光辅助尖端纳米制造（LA-TBN）过程中的基本光学和等离子体机制，利用了解来确定样品表面近场辐射增强和等离子体介导烧蚀的最佳条件，从而允许使用先进的控制技术来实现鲁棒，高速，高质量的LA-TBN。在LA-TBN过程中，近场辐射增强的等离子体介导的烧蚀效应和可能相关的热副作用将通过使用先进的控制技术进行模拟和实验来澄清和区分。所获得的知识将用于分析和优化纳米制造条件，以实现制造稳健性和质量。通过开发和实施先进的控制技术，将实现最佳的制造条件，从而实现高速、高质量的纳米制造。该技术将通过在单晶硅上制造迷宫般的复杂图案来实现和评估。该项目的成功不仅将显著增强LA-TBN工艺相对于其他纳米制造方法的优势，包括低成本、超高分辨率和可加工材料的多功能性，而且还将增加对这一有趣工艺所涉及的基本机制的理解。作为克服LA-TBN工艺中关键障碍的第一次系统尝试之一，该项目使该技术在具有战略意义的重要领域（如半导体）的生产实施具有这些优势。教育活动包括课程开发，招募和保留代表性不足的学生，以及扩展到K-12。

This collaborative research project is focused on understanding the fundamental optical and plasma mechanisms in the laser-assisted tip-based nanomanufacturing (LA-TBN) process, utilizing the understanding to identify the optimal conditions for near-field radiation enhancement and plasma-mediated ablation at the sample surface that allow the use of advanced control techniques to achieve robust, high-speed, high-quality LA-TBN. The near-field radiation enhanced plasma-mediated ablation effect and possibly associated thermal side effects during the LA-TBN process will be clarified and distinguished through simulation and experiments enabled by the use of advanced control techniques. The gained knowledge will then be used to analyze and optimize the nanofabrication conditions towards fabrication robustness and quality. The optimal fabrication conditions will be achieved through the development and implementation of advanced control techniques, which in turn, leads to high-speed and high quality nanofabrication. The technique will be implemented and evaluated through the fabrication of a maze-like complicated pattern in single crystal silicon. The success of this project will not only significantly enhance the advantages of the LA-TBN process over other nanofabrication methodologies, including low-cost, ultra-high-resolution and versatility in materials that can be processed, but willalso increase understanding of the fundamental mechanisms involved in this intriguing process. As one of the first systematic attempts to overcome critical barriers in the LA-TBN process, this project enables these advantages for the productive implementations of this technique in strategically important areas, such as semiconductors. The educational activities comprise curriculum development, recruitment and retaining of under-represented students, and outreach to K-12.