MRI: Acquisition of a Chlorine Reactive Ion Etching System

定向干法刻蚀是微纳器件研究和制造中的一种基本制造技术。该提案寻求资金，允许哥伦比亚大学获得一种先进的蚀刻系统，该系统允许多种用途，并将扩大哥伦比亚大学目前各种项目的范围，包括与纳米电子学、纳米生物学和纳米神经生物学、光电子学、光伏和医学研究有关的项目。该设备还将使一系列目前不可能实现的未来项目成为可能，包括纳米级的激光和一类被称为III/V半导体的半导体。作为对共享的哥伦比亚洁净室的重大升级--目前纽约市大都会地区唯一的共享洁净室设施--将要购买的蚀刻系统将直接影响哥伦比亚大学和邻近机构250多名研究人员(教职员工和学生)的教育和研究活动。联合首席调查员小组包括在洁净室董事会任职的所有研究人员，代表着在为各种和不断变化的用户成功安装和支持这种设备方面积累的经验。该设施还举办研究生和本科生的讲座和实验室课程，由合作PIS、REUS和RETS授课，以及由来自多个系的教员提供建议的独立学习项目。由于纳米刻蚀是这些课程的核心组成部分，所要求的刻蚀师将直接影响几个系的教育计划，为学生提供未来科学和工程职业的重要技能。本提案中描述的ICPRIE(电感耦合等离子体，反应离子刻蚀)系统将使用氯基刻蚀化学方法对化合物半导体、金属和有机材料进行垂直刻蚀。新的构图能力和系统将使一系列未来的项目成为可能，包括纳米级激光和基于III/V半导体的传感器。在蚀刻机的运行过程中，将系统地开发配方，以向所有研究人员提供最佳结果。哥伦比亚大学洁净室目前是纽约大都会地区唯一共享访问的微米和纳米制造设施，为不同的学术用户和小企业提供服务。该设施有长期的技术和行政支助，拟议的国际比较方案信息和传播技术系统将构成纳米科学和工程研究培训现有基础设施中的一个重要设施。该工具将直接供学生和博士后研究人员使用，作为他们研究活动的一部分，提供先进的纳米颗粒技术培训。

Directional dry etching constitutes a fundamental fabrication technique in the research and manufacturing of micro- and nanoscale devices. The proposal seeks funding to allow Columbia University to acquire an advanced etching system that allows for a diverse set of uses and will expand the range of a variety of current projects at Columbia, including projects related to nano-electronics, nanobiology and nano-neuro-biology, optoelectronics, photovoltaics and medical research. The equipment will also enable a range of future projects that are currently not possible, including lasers at the nanoscale level and a class of semiconductors known as III/V semiconductors. As a major upgrade to the shared Columbia Cleanroom -- currently the only shared cleanroom facility in the New York City metropolitan area --the etching system to be acquired will directly impact the educational and research activities of over 250 researchers (faculty, staff, and students) at Columbia and neighboring institutions. The group of co-Principal Investigators includes all the researchers who serve on the Cleanroom Board of Directors, representing an accumulation of experience in the successful installation and support of such equipment for a varied and evolving set of users. The facility also hosts graduate and undergraduate lecture and laboratory courses taught by the co-PIs, REUs and RETs, and independent study projects advised by faculty from many departments. Since nanopatterning is a central component of these courses, the requested etcher will directly impact the educational program of several departments, providing students with important skills for future careers in science and engineering.The ICP RIE (inductively-coupled plasma, reactive ion etching) system described in this proposal will employ chlorine-based etch chemistries for vertical etching of compound semiconductors, metals, and organic materials. The new patterning capability and system will enable a range of future projects including nanoscale lasers and sensors based on III/V semiconductors. During operation of the etcher, recipes will be systematically developed to provide optimal results to all researchers. The Columbia University clean room is currently the only shared-access micro- and nano-fabrication facility in the metropolitan New York City area and serves a diverse population of academic users and small businesses. The facility has permanent technical and administrative support, and the proposed ICP RIE system will constitute a crucial facility of the available infrastructure for research training in nanoscale science and engineering. The tool will be used directly by students and post-doctoral researchers as part of their research activities, providing training in advanced nanopatterning techniques.