Modelling and technological expansion of nanowire surface-controlled contact printing

纳米线器件的高效组装具有很高的应用和创新潜力。然而，将自下而上合成纳米线的优点与现代自上而下微加工的可能性联系起来的合适技术仍然缺乏。在拟进行的研究项目中，我小组最近开发的表面控制接触印刷技术将得到更详细的研究。原则上，该技术通过所谓的捕集器使平面单纳米线沉积在已知x-y位置和已知角对准的目标基板上（用硅纳米线演示）。这极大地支持了并行和大规模集成技术的连续利用，以实现高效的纳米线器件组装。在本研究项目的范围内，应开发第一个描述性模型，以支持技术扩展到其他材料系统，涉及使用的基材，捕集器设计和纳米线材料，并支持未来更高的印刷选择性和顺序印刷。此外，首先考虑表面控制接触印刷的动态参数，并基于纳米线修饰的原子力显微镜探针进行准原位印刷实验。

An efficient assembly of nanowire based devices possesses inherently a high application and innovation potential. Nevertheless, suitable technologies interlinking the advantages of bottom-up synthesized nanowires and the possibilities of modern top-down microfabrication are still missing. Within the proposed research project the recently in my group developed technology of surface controlled contact printing shall be studied in further detail. In principle, this technology enables planar single nanowire deposition on a target substrate (demonstrated with silicon nanowires) with known x-y-position and known angular alignment by means of so-called catchers. This significantly supports the successive utilization of parallel and large-scale integration technologies for an efficient nanowire device assembly. Within the scope of this research project, a first descriptive model shall be developed that supports the technological expansion to other material systems with respect to the used substrates, catcher design and nanowire materials as well as supporting in future higher printing selectivities and sequential prints. Furthermore, dynamic parameters shall be firstly considered for surface controlled contact printing and also quasi in-situ printing experiments will be done based on nanowire decorated atomic-force-microscopy probes.