Direct-writing laser lithography system (DLLS)

纳米结构中心是TU Kaiserlestern的核心研究设施，并作为服务中心运营。它已经拥有广泛的设备，用于基底和层的微结构和纳米结构化。本文提出的直写激光光刻系统旨在弥补掩模紫外光刻和直写电子束光刻之间的差距。随着无掩模光刻的应用，通过直接写入激光光刻的紫外线敏感的光致抗蚀剂，分层结构的快速原型成为可能。此外，在该机构首次，在光刻胶或层中生产三维（3D）结构而无需时间和成本密集型的灰度或光刻掩模生产变得可行。纳米结构中心沿着与物理系、电机系和信息技术系的其他三个研究小组一起申请激光光刻系统。参与小组正在进行微光学器件，微谐振器和太赫兹基超材料以及半导体激光器和微流体微透镜的横模选择领域的研究。最初，这些团队打算将激光光刻系统主要用于“快速原型”，随后也用于直接在光刻胶中生产3D结构。在激光光刻系统获得批准和安装后，纳米结构中心将进行工艺开发和优化。系统用户将得到相应的指示，并在开发和优化进一步流程方面得到支持。必要的工作人员长期受雇于纳米结构中心，在照片和电子束光刻领域具有多年的经验。

The Nano Structuring Center is a core research facility at the TU Kaiserslautern and is run as a service center. It already has extensive equipment for micro- and nanostructuring of substrates and layers. The direct-writing laser-lithography system as proposed here is intended to bridge the gap between mask-using UV-photolithography and direct-writing electron beam lithography. With the application of maskless lithography via direct writing laser lithography of UV-sensitive photoresists, rapid prototyping of layered structures becomes possible. Also, for the first time at this institution, the production of 3-dimensional (3D) structures in photoresists or layers without the time- and cost-intensive production of grayscale or photolithographic masks becomes feasible. As a result of structures being written partially with electron beam and partially with laser lithography ("mix and match"), samples can be produced faster and less cost intensive.The Nano Structuring Center is applying for the laser-lithography system in a collaborative effort along with three other research groups from the departments of Physics and Electrical Engineering and Information Technology. The participating groups are conducting research in the fields of micro-optical devices, micro resonators and terahertz-based metamaterials as well as transverse-mode selection of semiconductor lasers and microfluidic micro lenses. Initially, these groups are intending to use the laser lithography system primarily for 'rapid prototyping' and, later on, also for the production of 3D structures directly in photoresists. After approval and installation of the laser lithography system, the Nano Structuring Center will carry out process development and optimization. Users of the system will be instructed accordingly and supported with the development and optimization of further processes. The necessary staff are permanently employed to the Nano Structuring Center with many years of experience in the fields of photo and electron beam lithography.