Preparation of Amorphous Thin Films by Reactive Sputtering and Material design

采用硅化物、硼化物等新型陶瓷靶材，在O_2/Ar气氛下，用反应溅射法制备了非晶薄膜。这些目标之一是在本研究中使用的硅化铼（MoSi_2）。除MoSi_2复合靶外，还使用了其它三种靶（复合靶、钼靶和硅靶）。复合靶由Mo和Si片组成。然后分析了四种靶的溅射速率之间的关系，在考虑表面原子密度的情况下，MoSi_2靶和复合靶的溅射速率可以由Mo靶和Si靶的溅射速率来计算。由于重要的是，估计的组成和性能的基础上，使用单组分靶反应溅射制备的膜的信息，这些结果似乎是有用的，从材料设计的观点。

Amorphous thin films were prepared by reactive sputtering in O_2/Ar atmospheres with several new ceramic targets such as silicide and boride. One of these targets was a molybdenum-silicide (MoSi_2) used in this study. In addition to the MoSi_2 compound target, three other kinds of target (a composite, a Mo and a Si target) were used in this study. The composite target was composed of Mo and Si pieces. Then an analysis of the relations between sputtering rates of these four targets, the rates of both the MoSi_2 target and the composite target could be calculated by those from the Mo and the Si targets taking surface atomic density into consideration. Since it is important to estimate the composition and properties of films prepared by reactive sputtering with multi-component targets on the basis of information using single-component targets, it seems that these results were useful from viewpoint of material design.