X-Ray Spectroscopy with Multilayr Loated Gratings

采用超高真空电子束沉积法在浮法玻璃和层流光栅（槽数1200/mm，深度100A； 1200/mm, 200A; 500/mm, 400A）上沉积Pt/C多层膜（2d=80A，N=20和2d=100A，N=10）。它们的x射线光学特性是用我们实验室的特征x射线和UVSOR分子科学研究所的单色同步辐射来评估的。沉积在浮法玻璃上的多层玻璃在液氮温度下的x射线反射率高于室温下的反射率，而光栅则相反。用原子力显微镜（AFM）观察了表面粗糙度，阐明了这一事实。可以理解，多层材料的内应力取决于衬底的表面结构。在多层涂层之前，衬底上沉积的Cr缓冲层较厚，大大降低了x射线反射率。离子束辐照沉积表面不能有效地获得高反射率，从而提高界面粗糙度。利用单色同步辐射测量了多层光栅在1.2、1.7、2 02.8 keV能量下的x射线反射率，并与计算值进行了比较。结果表明，为了获得最高的反射率，应针对一定的x射线能量优化光栅槽深。

Pt/C multilayrs (2d=80A,N=20 and 2d=100A,N=10) were deposited on float glass and laminar gratings (groove number 1200/mm, depth 100A ; 1200/mm, 200A ; 500/mm, 400A) by means of an electron beam deposition method in ultra-high vacuum. Their x-ray optical properties were evaluated using characteristic x-rays in our laboratory and monochromatized synchrotron radiation at UVSOR,Institute for Molecular Science. X-ray reflectivity of multilayrs deposited on float glass at liquid nitrogen temperature is higher than those at room temperature, and vice versa for gratings. This fact is clarified by observing the surface roughness with atomic force microscope (AFM). It is understood that the internal stress of multilayrs depend on the surface structure of substrates. The thicker buffer layr of Cr deposited on substrate before multilayr coating considerably reduces x-ray reflectivity. Ion beam irradiation on deposited surface is not so effective to get high reflectivity, which is supposed to improve the interfacial roughness.X-ray reflectivity of multilayred gratings was measured at the energy 1.2,1.7,2,02.8 keV by monochromatized synchrotron radiation, which was compared with calculated values. It turns out that the groove depth of gratings should be optimized for a certain x-ray energy to get the highest reflectivity.