FABRICATION OF ULTRATHIN FILMS BY UV-LASER INDUCED PHOTO CHEMICAL DECOMPOSITION OF ADSORBED METALORGANIC COMPOUNDS

我们开发了一种新技术，使我们能够制造图案化的金属和金属化合物薄膜。在所开发的技术中，将含金属的前体分子金属有机分子引入具有由液氮冷却的冷指的真空室中，并吸附在放置在冷指上的玻璃板的表面上。所用前驱体为Cu（HFA）_2、Cu（HFA）_2、二茂镍和五羰基铁。用XeCl或KrF准分子激光聚焦照射吸附分子薄层。被照射的分子经历光化学分解，并产生碎片，金属原子，留在玻璃板上形成薄膜。当衬底温度升高时，仅在激光照射部分形成薄膜，未照射部分未反应的前驱体被抽空，当以含铜分子Cu（HFA）_2和Cu（HFA）_2为前驱体时，形成铜或氧化铜的超薄膜，当以二茂镍分子为前驱体时，形成镍的薄膜，沉积速率为0.1nm/s。当使用五羰基铁时，可以以0.3nm/s的沉积速率形成铁或铁氧化物薄膜，因此我们称之为低温光化学沉积（LTPCD）。

We have developed a new technique which allows us to fabricate patterned thin films of metals and metal-compounds. In the technique developed, metal containing precursor molecules, metaloganic molecules, was introduced into a vacuum chamber with a cold finger cooled by liquid-nitrogen and adsorbed on the surface of glass plate placed on the cold finger. The precursors used were Cu(DPM)_2, Cu(HFA)_2, nickelocene and pentacarbonyl iron. The thin layr of the adsorbed molecules were irradiated by focused output of a XeCl or a KrF excimer laser. The irradiated molecules underwent the photochemical decomposition and resulted fragments, metal atoms, left on the glass plate forming thin film. The film was formed only in laser irradiated part and unreacted precursors in non-irradiated part were evacuated away when the temperature of the substrate went up.When copper containing molecules Cu(DPM)_2 and Cu(HFA)_2 were used as precursor molecules, ultra-thin films of copper or copper oxide was formed.When nickelocene molecules were used, thin film of nickel was formed with a deposition rate of 0.1 nm/s. The film contains oxygen as an impurity but there is only a small contamination by carbon.When iron pentacarbonyl was used, thin film of iron or iron oxide was formed with a deposition rate of 0.3 nm/s.Thus the new technique, we would like to call it the Low-Temperature Photo^Chemical Deposition (LTPCD), has been established.