Study on Negative Ion Implantation for the Surface Modification of Polymer Materials without Defects for Bio-compatibilty Control

1.负离子源和负离子注入机的研制：我们研制了一台强射频等离子体溅射型重负离子源(RFNIS)，它可以以直流方式输出几mA的碳、硅、铜、银、氟、氧等多种元素的强流负离子束。此外，我们还研制了一台配备了小型RFNIS的中电流型负离子注入机，其中的清洁室使离子的注入既能在清洁条件下进行，又能在实际注入过程中进行。2.负离子注入过程中绝缘子表面电位的测量方法研究通过分析二次电子能量分布，提出了一种测量绝缘子表面充电电压的新方法。研究发现，负离子注入聚乙烯和聚苯乙烯片状绝缘子的表面充电电位在几伏到10伏的负压范围内。此外，我们还提出了一种电双层…。3.聚苯乙烯表面接触角的研究及引入官能团的检测正离子和氧离子注入后，聚苯乙烯与纯水的接触角随注入剂量的增加而减小。反之，碳负离子注入后，角度增大。一点。XPS测试结果表明，在聚苯乙烯的注入表面引入了C-O、C=0和O=C-O几种官能团。这些官能团导致了Ar和O注入时接触角的减小。但在碳离子注入中，人们认为表面碳原子的增加会影响聚苯乙烯表面接触角的增大。4.粉末非散射注入方法的发展通过正离子注入，从理论和实验上阐明了粉末在注入过程中的散射现象。相反，即使在能量为20keV的负离子注入中，也没有产生散射。这说明负离子注入是一种无散射注入方法。较少

1.Development of Negative-Ion Source and Negative-Ion implanter :We developed an intense RF plasma-sputter-type heavy negative-ion source (RFNIS) which can deliver hight-current negative-ion beams in a dc-mode with an intensity of several mA of various elements, such as Carbon, Silicon, Copper, Silver, Fluorine, and Oxygen. Besides, we also developed a medium-current type negative-ion implanter equipped a small-type RFNIS,of which a clean booth makes to implant ions in the clean condition as well as in the real implantation process.2.Development of a Method to Measure Surface Potential of Insulators during Negative-Ion ImplantationWe developed a new method to measure the charging voltage of insulator surface by the analysis of secondary electron energy distribution. It was found that the surface charging potential of negative-ion implanted insulators of polyethylene and polystirene plates was in the range form several to 10 volts negative. Besides, we proposed an electric double layr m … More odel as a low charging mechanism of insulators during negative-ion implantation.3.Investigation of the Contact Angle of Polystirene Surface and Detection of Introduced functional groupsBy the positive argon and oxygen ion implantation, the contact angle against pure water of the implanted polystirene decreased with an increase of the dose. On the contrary, by the carbon negative-ion implantation, the angle increased. a little. It was clear from the results of XPS measurements that several functional groups of C-O,C=0, and O=C-O were introduced in the implanted surface of polystirene. Then these functional groups resulted the decrease of contact angle for argon and oxygen implantation.. But in carbon ion implantation, it is considered that the increase of carbon atom at the surface will be affect to the increase of contact angle of polystirene surface.4.Development of Non-Scattering Implantation Method into PowdersWe clarified the scattering phenomenon of powders during implantation by theoretically and experimentally with a positive ion implantation. On the contrary, even in the negative-ion implantation with an energy of 20 keV,there was no scattering resulted. This shows the negative-ion implantation is non scattering implantation method. Less