X-ray scattering instrument for thin film analysis

有机和杂化材料在拜罗伊特大学发挥着重要作用。尤其是在纳米和中尺度结构上。该仪器将成为Keylab中尺度表征：散射技术的一部分，为巴伐利亚聚合物研究所和拜罗伊特大学的研究人员提供薄膜表征的新方面。该仪器可以表征薄膜中的纳米结构。它可以确定薄膜中物体的分离和物体的大小，以及晶体平面的分离和观察结构的方向。测量可以在各种环境条件下（温度，大气，电场），真空或空气中进行，并且能够确定从亚纳米到100纳米的广泛长度范围。这种结构分析与许多薄膜系统非常相关，从太阳能电池和多孔材料到非常薄的薄膜和单层，因为纳米结构决定了许多材料系统的功能。该仪器将允许几种不同的测量模式：GISAXS， GIWAXS和XRR（掠射小角度和广角x射线散射和x射线反射率），并允许在不同的测量模式之间自动切换。重要的是，垂直电子密度分布特征的测量将在相同的位置进行，就像在薄膜内部的结构分析一样。有了这个仪器，我们将能够检查薄膜的基本结构形成过程，并探测它们对各种加工参数的敏感性。这样就有可能确定决定结构的参数，并了解结构老化过程。

Materials of organic and hybrid origin play an important role at the University of Bayreuth. Particularly when they are structured on the nano and mesoscale. The instrument in question will be part of the Keylab Mesoscale Characterization: Scattering Techniques offering the new aspect of thin film characterization to be used by the researchers of the Bavarian Polymer Institute and the University of Bayreuth. The instrument allows the characterization of nanostructures in thin films. It is possible to determine object separations and object sizes in thin films as well as the separation of crystal planes and the orientation of the observed structures. The measurements can be carried out in various environmental conditions (temperature, atmosphere, E-field), in vacuum or air and is able to determine a broad range of length scales from sub nanometre up to 100 nanometres. Such a structural analysis is very relevant for many thin film systems, from solar cells and porous materials to very thin films and monolayers, because the nanostructur determines the functionality of many material systems. The instrument will allow several different measurement modes: GISAXS, GIWAXS and XRR (grazing incidence small and wide angle x-ray scattering and x-ray reflectivity) and allow to switch in an automised manner between the different measurement modes. Importantly, the measurements for the characterization of vertical electron density distributions will be carried out at the identical position like the structural analysis within the bulk of the film. With this instrument wewill be able to examine fundamental structure formation processes in thin films and probe their sensitivity to various processing parameters. This way it is possible to identify the parameters determinig the structure and to understand structural ageing processes.