PVD coating device

该应用研究装置为高能等离子体混合PVD涂层工艺的研究提供了基础，该工艺采用大功率脉冲磁控溅射技术与电弧技术相结合的形式。同时使用这两种工艺变体所产生的协同作用和开发具有改善摩擦学性能的新薄膜系统的潜力代表了一个有前途的研究领域。这将通过考虑薄膜的微观结构和相组成以及涂层工具在制造过程中的实际性能来进行研究。因此，材料技术领域的科学问题和生产工程中应用相关的基础研究都得到了解决。在此基础上，涂层装置为摩擦学应用提供了许多新的领域，同时通过使用所开发的涂层系统可以改善系统的性能。除了提高工具的性能外，这还包括针对组件和机器部件的摩擦优化和负载适应薄膜合成，以降低能耗并提高整体性能。此外，还研究了新生成靶材回收溅射材料的核心问题及其在镀膜过程中的应用行为。应用涂层装置从而巩固了在等离子辅助薄膜技术领域的领先地位，同时加强了德国作为创新和生产之地的地位。

The applied research device provides the basis for the investigation of hybrid PVD coating processes based on high-energy plasmas in the form of High Power Pulsed Magnetron Sputtering technology combined with Arc technology. The synergies and potential for the development of new thin film systems with improved tribological properties arising from the simultaneous use of the two process variants represent a promising field of research. This will be investigated by considering the microstructure and phase composition of the thin films up to the real performance of coated tools in manufacturing processes. Consequently, scientific questions in the field of materials technology and application-related fundamental research in production engineering are addressed. On this basis, the coating device offers a multitude of new fields for tribological applications, which at the same time leads to an improvement of the system behavior by using the developed coating systems. In addition to improving the performance of tools, this also includes the friction-optimized and load-adapted synthesis of thin films for components and machine parts to reduce energy consumption and increase the overall performance. Furthermore, core problems of the recycling of sputter materials by new generatively manufactured targets and their application behavior in the coating process are investigated. The applied coating device thus consolidates the pioneering position in the field of plasma-assisted thin-film technology and at the same time strengthens Germany as a place for innovation and production.