Formation of Ceramic-Coated Materials by RF Sputtering Method and the Materials Evaluation using Molecule dynamics

本课题研究了陶瓷在玻璃基片上的溅射过程及其分子动力学评价。在射频磁控溅射装置中，在玻璃基片上沉积了氧化铝和碳化硅薄膜。利用超显微硬度计对溅射膜的摩擦学性能进行了评价。结果表明，两种陶瓷薄膜的硬度均随射频输出功率的增加而降低。涂层材料的弯曲试验作为一种整体强度特性，也在三点弯曲下进行。一些涂层材料，特别是在较低的射频输出功率下，表现出比玻璃基板更低的强度。在这种情况下，在镀膜和衬底的界面附近观察到了导致最终断裂的缺陷。尝试用分子动力学方法来估算溅射薄膜的内应力场。溅射粒子的分子动力学采用硬球三维模型。根据经验信息，假设溅射粒子团簇随着射频输出功率的增加而增大。利用所提出的分析方法对实验结果进行了定性解释。

Sputtering process of ceramics on glass substrate and its evaluation based on molecule dynamics were investigated in this project.Thin films of alumina and silicon carbide were deposited on the substrate of borosilicate in an RF magnetron spattering apparatus. The hardness of the spattered films, as a tribological property, was evaluated by using an ultra-microscopic hardness testing machine. It was found that the hardness decreased with increasing RF output power in both ceramic films. Bending tests of coated materials, as a bulk strength property, was also carried out under 3-point bending. Some coated materials, especially under lower RF output power, showed lower strength than the glass substrate. In this situation, flaws which caused final fracture, were observed around the interface between coating film and substrate.A molecular dynamics approach was tried to estimate the internal stress field in sputtered film. A hard-sphere 3D model was adopted in the molecular dynamics of sputtered particles. Based on empirical information, cluster of sputtered particles was assumed to be larger with increasing RF output power. The experimental result was explained qualitatively by using the proposed analytical method.