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Microarchitecture of ceramic films

Microarchitecture of ceramic films
陶瓷薄膜的微结构
批准号:
11450247
负责人:
SAITOH Hidetoshi
金额:
$6.98万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001

项目摘要

项目成果

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中文摘要
翻译
在大气压下操作的化学气相沉积(CVD)能够控制陶瓷膜的微结构的形成。例如,形成控制在微米尺寸的晶须结构和网状结构。这种技术被定义为陶瓷膜的微结构。利用微结构、场致发射器件、结构材料、光学器件等都可以设计出来。在这个项目中,提出了独特的性能和结构。(1)ZnO、MgO、Y_2O_3晶须的制备建立了ZnO、MgO、Y_2O_3晶须的制备方法。(2)MgO/ZnO异质晶须MgO晶须外延生长在ZnO晶须上。X射线衍射分析表明,所有的结晶方向之间的ZnO和MgO晶须对齐。(3)荧光晶须Y_2O_3:RE(RE= Eu,Tb,Tm)晶须的光致发光强度比Y_2O_3:RE粉末的光致发光强度强。(4)场发射ZnO:Al导电晶须具有较强的场发射性能。(5)ZnO:Al导电晶须的力学性能ZnO:Al导电晶须的力学强度与Al的含量有关,当Al含量为0.2 ~ 1.0at%时,其强度很低,但当Al含量超过1.0at%时,其强度变强。
英文摘要
A chemical vapor deposition (CVD) operated under atmospheric pressure enables to control formation of the microstructure of the ceramic films. For example, whisker structure and mesh structure controlled at micrometer size are formed. This technique is defined as microarchitecture of the ceramic films. Using microarchitecture, field emission devices, structural materials, optical devices are able to be designed. In this project, unique properties and structures were proposed.(1) Manufacture of ZnO, MgO, Y2O3 whiskersManufacture of ZnO, MgO, Y2O3 whiskers were established.(2) MgO/ZnO heterowhiskersMgO whiskers were epitaxially deposited on the ZnO whiskers. X-ray diffractometry revealed that all crystalline directions were aligned between ZnO and MgO whiskers.(3) Phosphor whiskersPhoto-luminescence intensity of Y2O3: RE (RE= Eu, Tb, Tm) whiskers was stronger than that of powder of Y203:RE(4) Field emissionZnO:Al conductive whiskers showed relatively strong field emission properties.(5) Mechanical properties of ZnO:Al conductive whiskersMechanical strength of the ZnO:Al was dependent upon the dose of Al. Although the strength was extremely low at the Al concentration of 0.2〜1.0 at%, it became strong over 1.0 at%.
期刊论文(18)
专著(0)
科研奖励(0)
会议论文
Y. Ohkawara, T. Naijo, T. Washio, S. Ohshio, H. Ito, H. Saito: "Field emission property of Al:ZnO whiskers modified by amorphous carbon and related films"Field emission property of Al:ZnO whiskers modified by amorphous carbon and related films. 40-12. 701
Y. Ohkawara、T. Naijo、T. Washio、S. Ohshio、H. Ito、H. Saito:“非晶碳及相关薄膜改性的 Al:ZnO 晶须的场发射特性”改性 Al:ZnO 晶须的场发射特性
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通讯作者:
H.Saitoh, Y.Namioka, H.Sugata, S.Ohshiro: "Nanoindentation analysis of Al : ZnO epitaxipl whiskers"Japanese Journal of Applied Physics. 40. 6024-6028 (2001)
H.Saitoh、Y.Namioka、H.Sugata、S.Ohshiro:“Al : ZnO 外延晶须的纳米压痕分析”日本应用物理学杂志。
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通讯作者:
斎藤秀俊: "アモルファス炭素系膜をコートした酸化物マイクロアーキテクチャからの電界放射"NEW DIAMOND. 17. 17-21 (2001)
Hidetoshi Saito:“涂有非晶碳膜的氧化物微结构的场发射”新钻石。17. 17-21 (2001)
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通讯作者:
H.Saitoh,S.Ohshioら: "Homogeneous growth of zinc oxide whiskers"Japanese Journal of Applied Physics. 38(12). 6873-6877 (1999)
H.Saitoh、S.Ohshio 等人:“氧化锌晶须的均匀生长”日本应用物理学杂志 38(12) 6873-6877 (1999)。
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共 9 条
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