Magnetron Co-Sputtering System

磁控溅射是自旋电子学研究、开发和应用中常用的制备薄膜系统的方法。共溅射系统允许从不同的元素合成层状系统和合金，以便迅速将想法从材料研究转化为面向应用的自旋电子系统的开发。申请组的工作是用于自旋电子学、反铁磁性自旋电子学、自旋轨道扭矩和磁性以及氧化物非易失性存储元件的金属间化合物材料领域。在这里申请的项目中，将购买一个现代化的半自动磁控共溅射设备，有九个源。其他要求包括在超高真空中沉积、用氮气和氧气进行反应溅射、在高达700°C的温度下沉积，以及灵活配置源和基片支架之间的工作距离和沉积角度。该系统将主要由电气工程和信息技术部的新材料电子部门使用，并将成为该部门实验基础设施的核心。材料和地球科学部薄膜组与脉冲激光沉积、分子束外延和离子束刻蚀集群系统的集成将大大扩展两个组的实验能力，并加强部门之间的合作。

Magnetron sputtering is a common method for synthesizing thin film systems for spintronics research, development and application. A co-sputtering system allows to synthesize layer systems and alloys from different elements in order to quickly transfer ideas from materials research into the application-oriented development of spintronic systems. The work of the applicant groups is in the area of intermetallic materials for spintronics, antiferromagnetic spintronics, spin-orbit torques, and magnetic as well as oxide nonvolatile memory elements. In the project applied for here, a modern, semi-automated magnetron co-sputtering facility with nine sources is to be acquired. Other requirements include deposition in ultra-high vacuum, reactive sputtering with nitrogen and oxygen, deposition at temperatures up to 700°C, and a flexible configuration of working distances and deposition angles between sources and substrate holder. The system will be used predominantly by the New Materials Electronics group at the Department of Electrical Engineering and Information Technology and will be the centerpiece of the group's experimental infrastructure. The integration with the cluster system of Pulsed Laser Deposition, Molecular Beam Epitaxy and Ion Beam Etching of the Thin Films group at the Department of Materials and Earth Sciences will significantly extend the experimental capabilities of both groups and strengthen the collaboration between the departments.