Device for Pulsed Laser Deposition (PLD) of thin films

我们需要一种脉冲激光沉积（PLD）薄膜的装置，该装置使用波长为248 nm的KrF准分子激光器。化学重点将放在沉积主要由氧化物组成的薄膜上，但也有其他复杂的化合物，如氟氧化物、氟化物或硅化物，以及碳材料（无定形的或类似金刚石的碳）、其他硫化物或太阳能电池材料将成为目标。使用该装置，外延和多晶薄膜都将生长，并且生长将通过集成的RHEED系统进行现场监测。衬底温度将达到900 - 1000°C，激光脉冲、频率、气体类型和压力以及到目标的距离将发生变化。所获得的薄膜将通过各种可用的方法（其中包括磁化测量、阻抗谱以及电化学表征）来表征其功能特性。通过这种方式，我们的目标不仅是合成通过常规合成途径无法获得的功能材料，而且是多层体系作为各种应用（其中包括氟离子电池）的原型。该系统应该是用户友好的低安全要求，使其可访问的各种用户在斯图加特大学。通过连接到可用的手套箱系统，将进一步减少残余分压，并方便处理敏感样品。

We request a device for pulsed laser deposition (PLD) of thin films, which uses a KrF excimer laser with a wavelength of 248 nm. The chemical focus will be set on depositing films of mainly oxides, but also other complex compounds like oxyfluorides, fluorides, or silicides, as well as carbon materials (amorphous, or diamond like carbon), other chalkogenides or materials for solar cells will be targeted. With the device, both epitaxial as well as polycrystalline films will be grown, and the growth will be monitored in-situ with an integrated RHEED system. The substrate temperature will reach temperatures upto 900 - 1000 °C, and laser pulse, frequency, type and pressure of gas and distances to the target will be varied. The obtained films will be characterized regarding their functional properties via a variety of methods available, among them magnetisation measurements, impedance spectroscopy, as well as electrochemical characterization). By this, we aim to synthesize not only functional materials which cannot be obtained via conventional synthesis routes, but also multilayer systems as prototype for various applications (among them fluoride ion batteries). The system should be user-friendly with low safety requirements to make it accessible to the various users at University of Stuttgart. Via a connection to an available glovebox system, residual partial pressures will be further minimized and handling of sensitive samples will be facilitated.