Development of quantitative analysis system for electron microscope images observed with imaging plates

利用网络系统和工程工作站，开发了一套电子显微镜成像板图像的定量图像处理系统。研究了成像板的基本性能，如分辨率和衰落现象。根据材料的性质，利用定量分析系统，对电子衍射图和高分辨率图像进行了详细的分析。在电子衍射图的分析中，清晰地分析了化合物半导体中扩散散射的详细强度分布，明确了组成元素的有序原子排列。另一方面，在高分辨率电子显微镜图像的分析中，引入了残差指数。通过最小化剩余指数，定量分析了高温超导体中组成元素的缺陷。由于定量分析系统可以应用于传统的电镜图像分析，它将在电子衍射图样和高分辨率电子显微镜图像的定量分析中非常有用。

A quantitative image processing system for electron microscope images obtained with imaging plates has been developed by utilizing the network system (TAINS) and an engineering work station. Basic properties of the imaging plates, such as the resolution and fading phenomena were also investigated. Based on the properties and using the quantitative analysis system, detailed analysis of electron diffraction patterns and high-resolution images was carried out. In the analysis of electron diffraction patterns, detailed intensity distribution of diffuse scattering in compound semiconductors was clearly analyzed to make clear the ordered atomic arrangement of the constituent elements. On the other hand, in the analysis of high-resolution electron microscope images, a residual index was introduced. By minimizing the residual index, deficiency of the constituent elements in a high-Tc superconductor was quantitatively analyzed. Since the quantitative analysis system can be applied to the image analysis with conventional EM films, it will be very useful in quantification for both electron diffraction patterns and high-resolution electron microscope images.