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Structural and Optical Characterization of a Quantum Wire

Structural and Optical Characterization of a Quantum Wire
量子线的结构和光学表征
批准号:
08044149
负责人:
NAKASHIMA Hisao
金额:
$5.89万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for international Scientific Research
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1997

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中文摘要
翻译
利用分子束外延(MBE)技术,在GaAs(110)面上自然形成了GaAs量子线,这些量子线的形成是由于在GaAs(110)面的巨台阶边缘形成了相干排列的巨生长台阶和GaAs层的可标记厚度调制。透射电子显微镜(TEM)、原子力显微镜和光致发光(PL)测量一致地证实了量子线的形成。虽然在这些量子线中观察到了平行于线方向的强偏振的PL,但是PL仍然很宽,这被认为是由于量子线结构的不均匀性。为了提高均匀性,我们采用了两步生长和生长中断的方法。为了了解单根量子线的发光特性,我们进行了微区荧光和扫描阴极荧光的测量。观察到单量子线的尖锐发光峰。我们还在具有巨台阶的邻位(110)面上生长了InAs和InGaAs层,发现在巨台阶边缘形成了InAs和InGaAs量子线和量子点。
英文摘要
We have demonstrated that GaAs quantum wires were naturally formed on vicinal GaAs (110) surfaces misoriented toward (111) A using MBE.These naturally formed quantum wires were induced by the formation of coherently aligned giant growth steps and temarkable thickness modulation of GaAs layrs at giant step edges. Transmission electron microscopy (TEM), atomic force microscopy and photoluminescence (PL) measurements consistently confirmed this formation of quantum wires. Although the PL strongly polarized parallel to the wire direction was observed for these quantum wires, the PL was rether broad and is thought to be due to the nonuniform quantum wire structures. To improve the uniformity, we employed the two-step growth and growth interruption method. More red-shifed and narrower PL peaks were abserved, indicating the thicker GaAs layrs at the step edges and the improved uniformity of the quantum wire structures.In order to know the luminescence from single quantum wires, we carried out micro-PL and scanning cathodoluminescence measurements. Sharp luminescence peaks were observed for single quantum wires. These sharp peaks are considered to come from the localized excitions.We also grow InAs and InGaAs layrs on the vicinal (110) surfaces with giant steps and found that InAs and InGaAs quantum wires and dots were formed at the giant step edges.
期刊论文(9)
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会议论文
H.Nakashima: "Effects of growth interruption on uniformity of GaAs quantum wires formed on vicinal GaAs (110) surfaces by MBE" Material Sci.& Eng.B. (発表予定).
H.Nakashima:“生长中断对通过 MBE 在邻位 GaAs (110) 表面上形成的 GaAs 量子线的均匀性的影响”材料科学与工程 B(待提交)。
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B.R.Sim, S.Torii, K.Kobayashi, K.Maehashi, S.Hasegawa, K.Inoue, and H.Nakashima: ""Formation of InGaAs Strained Quantum Wires on GaAs (110) Vicinal Substrates by MBE"" Solid State Electron. (in press).
B.R.Sim、S.Torii、K.Kobayashi、K.Maehashi、S.Hasekawa、K.Inoue 和 H.Nakashima:“通过 MBE 在 GaAs (110) 邻位衬底上形成 InGaAs 应变量子线””固态电子
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H.Nakashima: "Photoluminescence and photoluminescence excitation of AlGaAs/GaAs quantum well with growth interrupted heterointerfaces grown by molecular beam epitaxy" Superlattices and Microstructures. 22・1(発表予定). (1997)
H. Nakashima:“通过分子束外延生长中断异质界面的 AlGaAs/GaAs 量子阱的光致发光和光致发光激发”超晶格和微结构(即将发表)。
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T.Kato: "Stacked GaAs multi-quantum wires grown on vicinal GaAs (110) surfaces by molecular beam epitaxy" Appl.Phys.Lett.72・4. 465-467 (1997)
T.Kato:“通过分子束外延在邻位 GaAs (110) 表面上生长的堆叠 GaAs 多量子线”Appl.Phys.Lett.72・4 (1997)。
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共 9 条
    Study of Modulation Doped Quantum Wires.
    • 批准号:
      11694158
    • 项目类别:
      Grant-in-Aid for Scientific Research (B).
    • 资助金额:
      $5.25万
    • 财政年份:
      1999
    • 负责人:
      NAKASHIMA Hisao
    • 依托单位:
    Molecular Beam Epitaxial Growth of GaAs on Porous Si
    • 批准号:
      01460077
    • 项目类别:
      Grant-in-Aid for General Scientific Research (B)
    • 资助金额:
      $4.1万
    • 财政年份:
      1989
    • 负责人:
      NAKASHIMA Hisao
    • 依托单位:
    海外基金