Deposition Behaviors of Co-Ni and Co-Fe alloys by Electrochemical Graphoepitaxy

电沉积Co-Fe和Co-Ni合金作为磁性记录材料的一种新的制备方法，由于其相对于化学气相沉积法和溅射法具有工艺简单、成本低廉等优点，近年来受到了人们的关注，在此背景下，我们采用电沉积法制备了Co-Fe和Cc-Ni合金薄膜。确定了制备这些合金的最佳实验条件，并对合金的晶格结构和表面形貌进行了分析。在这项工作中制备的这些合金的组成仅取决于电解质浴。因此，在该制备物上的沉积行为表现为反常类型。基于这一结果，我们选择了铜单晶[Cu（100），Cu（110），Cu（111）]作为衬底，这将使这些合金的外延生长，从错配到钴的C轴的观点。在Co-Fe系中，在Cu（100）和Cu（110）上制备的薄膜为多晶结构。而Cu（111）上的薄膜具有较强的取向性。这些结果为电化学图形外延技术在Co-Fe或Co-Ni合金中的实际应用提供了可能性。

The electrodeposition of Co-Fe and Co-Ni alloys, which can be applied to the magnetic materials for records, has been noticed in recent years, since this method have been the economical and simple process in comparison with other method such as chemical vapor deposition and spattering.In such situation, we have prepared the thin film of Co-Fe and Cc-Ni alloys by the electrodeposition. Moreover, we have specified the optimum experimental condition on the preparation of these alloys and analyzed the lattice structure and surface morphology of them. The composition of these alloys prepared in this work only depends on that of the electrolyte bath. Then, the deposition behavior on this preparation shows anomalous type. Based on this result, we have selected the copper single crystal [Cu (100), Cu (110), Cu (111)] as a substrate, which would enable the epitaxial growth of these alloys, from the viewpoint of misfit to C axis of cobalt. In Co-Fe system, the thin film prepared on Cu (100) and Cu (110) has poly-crystal. On the other hand, that on Cu (111) has the strongly orientation. These knowledge obtained in this work indicate the possibility to the practical application of electrochemical graphoepitaxy of Co-Fe or Co-Ni alloys.